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Topics Covered
Background
Ferroelectric
materials
Pb(Zr1-xTix)O3
Ba1-xSrxTiO3
Ferroelectric Thin Film
Characterization
Pb(Zr1-xTix)O3
Ba1-xSrxTiO3
Conclusion
Background
Recently, both academic and industrial interests have focussed on
ferroelectric thin films. This interest is due to the importance of these films
as the capacitors for ferroelectric random access memory (FeRAM).
Ferrolectric thin films have attracted much attention for potential
applications such as high dielectric constant capacitors, infrared detectors,
piezoelectric transducers, optical modulators, optical waveguides, nonvolatile
memory chips and capacitors for dynamic random access memory (DRAM). Their
ferroelectric and dielectric properties have been extensively investigated,
while their optical properties have been relatively rarely studied. However, the
optical constants, e.g., refractive index and extinction coefficient have great
importance for waveguiding and other optical applications. The Phase Modulated
Spectroscopic Ellipsometer (PMSE) has been used to determine the optical
constants of PZT and BST materials.
Ferroelectric materials
Ferroelectric materials exhibit a spontaneous electric polarization,
spontaneous in the sense that the polarization appears even in the absence of an
electric field. The name ferroelectric was chosen by analogy with ferromagnetic
materials, which exhibit a spontaneous magnetization even in the absence of a
magnetic field. However, the name is misleading because few ferroelectric
materials contain iron whereas most ferromagnetic materials do.
Ferroelectric materials are a subgroup of pyroelectric materials which are a
subgroup of piezoelectric materials.
Pb(Zr1-xTix)O3
Lead zirconate titanate (PZT) is very useful ferroelectric material because
of its pyroelectric, piezoelectric and electro-optical properties. High remnant
polarization, high dielectric constant, low operating voltage, and low leakage
current are attributes of PZT thin films. Thin PZT films have been widely
investigated for application in dynamic random access memories (DRAMs) and
nonvolatile random access memories (NVRAMs).
Ba1-xSrxTiO3
Barium strontium titanate (BST) is the established dielectric capacitor
material for future DRAM devices, allowing a significant reduction of cell
capacitor size due to its high-k properties. The ferroelectric thin films can be
deposited by sputtering, chemical vapour deposition, sol-gel method, and using
pulsed laser ablation.
Ferroelectric Thin Film Characterization
Non destructive characterization of the different ferroelectric films was
successfully carried out by Spectroscopic Ellipsometry (SE). Ellipsometric measurements
were collected at an angle of incidence of 70° across the spectral range
190-850nm.
Pb(Zr1-xTix)O3
PZT thin films have been grown directly on Pt (100nm) / Ti / SiO2
/ c-Si substrate. Due to the Pt thickness, a pseudo 3-phase model - air / PZT /
Pt - has been used. The PZT coating has been described using a 3 layers stack
where the density of the PZT decreases from the bottom to the top surface. This
index variation is described using the Bruggeman Effective Medium
Approximation.
|
80% PZT
- 20% Void |
21.4
nm |
|
86.4%
PZT - 13.6% Void |
82.4
nm |
|
PZT |
12
nm |
|
Pt |
|

Figure 1. Generated and Experimental Spectra
The PZT optical constants have been determined using the Adachi-New Forouhi
advanced dispersion formula.

Figure 2. PZT Optical Constants
Ba1-xSrxTiO3
BST thin film has been deposited using Pulsed Laser Deposition (PLD) onto
polished sapphire substrates. The measurement takes into account the backside
reflection of transparent sapphire substrate.
The model below has been used to fit perfectly this sample. It includes an
overlayer and an anisotropic substrate. The optical axis of the sapphire
substrate is perpendicular to the sample’s plane. By adding a roughness layer
consisting of a mixture of 50% BST and 50% void the fit was improved
significantly.
|
80% PZT
- 20% Void |
6.2
nm |
|
86.4%
PZT - 13.6% Void |
67.7
nm |
|
Uniaxial
Anisotropic Sapphire (Al203) ne,
no
|
520
μm |
|
Void |
|

Figure 3. Fit results - BST on sapphire substrate
This spectrum above shows numerous interference fringes. The smallest period
corresponds to the anisotropic behaviour of the sapphire additional to the
backside reflection while the greater period is due to the BST coating.
The spectrum below shows the same sample if the sapphire would have had an
unpolished backside.

Figure 4.Simulation of BST on sapphire substrate without
backside

Figure 5. BST Optical Constants
Conclusion
Spectroscopic
ellipsometry is a powerful technique to characterize the thickness and
optical constants of complex ferroelectric stacks with high accuracy and
precision. Specific modelling features in
this study include the characterization of the anisotropic sapphire substrate,
rough overlayer and layer inhomogeneity with depth.
Source: Horiba Scientific – Thin Films Division
For more information on this source please visit Horiba
Scientific – Thin Films Division
Date Added: May 1, 2007
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