The U-eLektron Ebeam system was designed to provide a research and development
oriented solution to labs of any size. As a bench top tool, the U-eLektron can
provide immediate results without the cost or time required for external testing.
Unique USHIO Ebeam sources provide electron beams with potentials of 10-50
keV. These units are compact, self-shielding, and have their own exposure chamber.
These systems are modular, user friendly and designed for ease of maintenance.
- Low voltage electrons
- Allows maximum transfer of energy into the surface of the exposed material
- Optimizes reactions in this 10-50 micron depth.
- Minimizes effects on or damage to the substrate below this depth
- Compact, self-shielding unit Supports selected reactions with specificity
not available from higher power sources