A*STAR Institute of Microelectronics (IME) and Picosun Oy, a Finland-based global manufacturer of Atomic Layer Deposition (ALD) equipment, have announced a partnership to develop advanced ALD techniques to enable continuing growth in the areas of next generation memories and solar cells.
With this collaboration, IME and Picosun will jointly develop innovative ALD and plasma-enhanced ALD (PEALD) processes for novel dielectrics and metals for applications in resistive switching non-volatile memories (NVM), multilayer metal-insulator-metal (MIM) capacitors, solar cells, and advanced complementary-metal-oxide-semiconductors (CMOS). Enabling integration of the processes with the devices for industrial applications will be the core objective of the joint research project.
"IME is continually engaging with strategic partners to enable breakthroughs in novel technologies," says Prof. Dim-Lee Kwong, Executive Director of IME. "Picosun's state-of-the-art ALD technology and unparalleled expertise in the field will complement our expertise to spearhead new technologies and bring the results of our R&D to our partners rapidly."
"We are excited to partner with IME to speed up the R&D of novel, groundbreaking semiconductor, IC and renewable energy technologies. Establishing the IME-Picosun partnership ties closely also to the recent opening of Picosun's first Asian subsidiary, Picosun Asia Pte. Ltd. in Singapore," states Mr. Kustaa Poutiainen, CEO of Picosun. "As the demand for Picosun's ALD equipment is booming also in Asia, the presence of local subsidiary along with local R&D partners and demo facilities equipped with PICOSUN ALD tools will be of immense help to provide always first class customer service, rapid demonstrations and product deliveries, and timely after sales and field service operations."