Aug 6 2014
Dow scientists, who led the development of an advanced microchip technology that enabled high-volume semiconductor manufacturing across multiple generations were named 2014 “Heroes of Chemistry,” a prestigious award given by the American Chemical Society (ACS).
The award recognizes the Dow Electronic Materials’ team for its development of Dow’s AR™ Fast Etch Organic Bottom Antireflectant Coatings (BARCs), which enable high resolution microlithography in the manufacture of advanced integrated circuits. Antireflectant materials in microlithography are needed to control optical reflection in the imaging film. Dow’s development of fast etch organic BARCs were groundbreaking because they allowed the industry to reliably print the thousands of tiny circuit lines needed for mass production of the modern microchip.
“What sets Dow’s development apart are the fast etch properties and the easy removal without significant loss of the photoresist film thickness,” said Cathie Markham, Global R&D Director for Dow’s Electronic Materials’ business. “These attributes are key to making advanced integrated circuits at high throughput with good electrical performance and in high yield. Working with customers’ leading-edge chip designs, this team advanced the integrated circuit, which is central to electronics today. They are certainly deserving of this honor.”
Markham added, “This recognition reflects well upon the many scientists and engineers at companies around the world who have applied game-changing chemistry to move microelectronics forward.”
On August 10, at the ACS Annual Meeting in San Francisco, the Dow scientists that will be honored are: Dr. Suzanne Coley, Dr. Vipul Jain, Dr. Doris Kang, Amy Kwok, Dr. Owendi Ongayi, Dr. James Thackeray, Dr. Peter Trefonas, and Sabrina Wong along with Tim Adams, Edward Pavelchek, Dr. Anthony Zampini, Dr. Gerald Wayton, and Dr. Jeong Yun Yu who were with Dow at the time of the discovery.
Source: http://www.dow.com/