Oct 21 2014
Hitachi High-Technologies Corporation (TOKYO: 8036, Hitachi High-Tech) has been awarded the “Good Design” award for their newest Scanning Electron Microscope (SEM), the SU5000.
This new field emission SEM has been designed to provide ease of use along with learning tools to make even the novice user feel like they have some SEM “experience”, while also offering them the ability to migrate towards a more competent level of usage. Its user-friendly interface has been designed for both novice and experienced users.
The Good Design Award is an annual comprehensive design evaluation program that’s been well known in Japan since 1957. The SU5000 offers an easy interface whereby anyone can obtain high quality electron images relatively easily by giving the SEM some basic information about the specimen and the data required from that specimen. Due to an increased need for materials analysis, the SEM’s market share is increasing, and along with it the demand for higher-resolution SEM imaging for novice users is also growing.
In addition to this basic technology requirement, this new SU5000 fosters the ability of inserting a specimen into the SEM chamber for recording images quickly via an interface that automatically sets the optimum SEM operating conditions from specific observation mode choices. Focus and astigmatism correction is also performed from this to ensure high quality imaging.
SU5000 Key Features:
- A revolutionary user interface, “EM Wizard”, which provides any user the ability to achieve optimal resolution, repeatability, and increased productivity in their lab.
- An automated optical axis alignment technology (auto-calibration) that restores the microscope to its “optimum conditions” on demand.
- A “Multi-Finder” feature that allows the sample to be viewed from any orientation desired via stage automation.
- A unique BSE detector design with excellent low and high angle BSE image collection capability.
- The ability to display 4 simultaneous “LIVE” images from various detectors.
- A robust “drawer type” stage door with a large specimen chamber that can accommodate very large specimens (~200mmφ、~80mmH).
- Rapid sample exchange; via a robust vacuum/evacuation design allowing image observation in 3 minutes or less.
- Several ports for adding various analytical technologies including EDS ,WDS, EBSD, CL, Cryo, Plasma Etch, etc.