Semilab designs, produces and sells metrology equipment for the characterization of semiconductor and photovoltaic materials, for monitoring the manufacturing process of semiconductor devices and solar cells, and also for R&D purposes in these areas. Semilab offers a variety of measurement techniques; most of them are non-contact and non-destructive. Many of Semilab's technologies can be flexibly integrated in different platforms, ranging from simple handheld devices and table-top systems with high resolution mapping capability to fully automated stand-alone production control tools for mid-range and high-level fablines. Semilab also offers in-line measurements for solar cell production lines.
What is Epi Deposition?
A blanket layer of silicon can be added to a silicon substrate, via a CVD process, to achieve changes in properties like resistivity, type, and defect density. This CVD process is called epi (or expitaxial) deposition. Part of the production process of making epi wafers is monitoring the resistivity of the epi layer. This monitoring is done on a sample basis, or only to confirm that the epi reactor is set up properly. When the epi layer is of opposite type to the substrate wafer, the monitoring is usually done by 4-point probe. When the epi layer is the same type as the substrate, the monitoring is usually done by some form of CV, such as CV Schottky or Hg-probe.
Non-Contact Method of Creating CV Doping Profile
Semilab offers a non-contact method of creating a CV doping profile, and this technology is incorporated into the various models of the Epimet product line. Epimett stands for Epitaxial Metrology.
Product Solutions for Epi Layer Monitoring
Product solutions for Monitoring Resistivity of Epi Layer from Semilab include:
- FAaST Near Surface Doping
- SSM 5400 System
This information has been sourced, reviewed and adapted from materials provided by Semilab Semiconductor Physics Laboratory.
For more information on this source, please visit Semilab Semiconductor Physics Laboratory.