The use of a template-based approach for nanomaterial synthesis holds potential for new material development as well as in energy and other fields. Carbon nanotubes are used as templates to which the external contour is applied. Processes such as atomic layer deposition (ALD) and plasma enhanced chemical vapor deposition (PECVD) have been analyzed for many different materials, including Al2O3 and SiO2.
Advantages of Using Carbon Nanotube Templates
PECVD processes can provide conformal coating on carbon nanotube templates, while plasma-enhanced ALD processes do not reveal the obvious damage caused to the morphology of carbon nanotubes during the deposition process.
Moreover, pretreatment is not required for the creation of conformal coating of SiO2 and Al2O3 analyzed using carbon nanotube template. Furthermore, it is possible to treat and remove the carbon nanotubes as the sacrificial template in the preparation of the nanostructures with original contour. This can be considered for the development of 2D and 3D nanostructure of the desired materials for their application in relevant fields.
The method of utilizing PECVD and ALD processes enables the flawless integration of such kind of synthesis process with production processes of existing semiconductor and energy industries.
This information has been sourced, reviewed and adapted from materials provided by Oxford Instruments Plasma Technology.
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