Vion Plasma Focused Ion Beam (PFIB) from FEI

The Vion™ plasma focused ion beam system (PFIB) delivers excellent milling and imaging performance and considerably improves lab capacity. In comparison with traditional gallium-based FIB, the single, easy-to-use instrument increases throughput over 20 times for site-specific, cross-sectional milling and large region of interest preparation for other analytical methods.

Vion PFIB for Materials Science

The Vion PFIB supports a range of materials characterization, sample preparation applications and failure analysis, and is suitable for composites, coatings, and metals.

The key benefits are listed below:

  • Produces site-specific cross sections rapidly
  • Acquires better milling speed without compromising on quality for both large area and recurring milling projects, and for low sputter rate materials such as steel
  • Allows speedy site-specific micromachining of structures and surfaces for dynamic compression or tensile testing
  • Prepares site-specific, high quality surfaces for electron back scattered diffraction testing
  • Prepares specimens for other imaging and characterization methods such as TEM and SEM
  • Obtains sub-30nm image resolution for rapid identification and metrology of thin structures and layers.

Vion PFIB for Electronics

The key benefits are listed below:

  • Can be used for process monitoring and development at die/package level
  • Failure analysis of TSVs, bumps, stacked die, and wire bonds
  • Surgically remove material so as to enable failure analysis and fault isolate on buried die
  • Defect evaluation of MEMS devices and packaged components

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