Integrated ALD System - Glovebox

The Glovebox Integrated ALD system from OkyayTech comprises a stainless steel reactor chamber with substrate sizes of 100, 200, and 300 mm.

It also has up to eight precursor lines, heated gas manifold and delivery lines, solid/liquid/gas precursors delivery, MFC controlled purge/carrier gas, and GUI/Recipe controlled isolation valve.

The Glovebox Integrated ALD system can be heated to a temperature of up to 250 °C standard (400 °C optional). The precursor lines can be individually heated up to 200 °C.

Application areas are; perovskite and tandem photovoltaic cells, ALD for energy storage and conversion, and catalysts via ALD. OkyayTech is working with corporate clients to develop ALD recipes and deposition tools for Perovskite-Silicon Tandem Solar Cells Research


  • Easy-to-use GUI
  • Fully automated with recipe control
  • High aspect ratio 3D Surround Coat™ for high surface area coating
  • Top-notch scientific support team and recipe library

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