Plasma Enhanced ALD System - Layerava®

OkyayTech’s Layerava® is a plasma enhanced ALD system that has a compact reactor design. The ALD system is equipped with a large-area, high-density, hollow cathode source.

Hollow cathode plasma sources are extensively used by the ALD research community as alternatives for inductively coupled plasma (ICP) sources, as there is less oxygen contamination when placing non-oxide materials. But there may be much greater benefits for the industry going forward.

The system assures a very high radical flux, to the point where the ion signal (ion densities are analogous to ICP sources) is flooded by the signal of radicals at the time of the optical emission spectroscopy measurements, and comparatively low plasma damage.

A table provided below illustrates some useful results that demonstrate the benefit of breaking away from the traditional ICP plasma delivery model.

It is possible to configure Layerava® for use with chlorine, ammonia, nitrous oxide, argon, hydrogen, nitrogen, oxygen, and even other gases.

Hollow cathode plasma sources have been used with chlorine, oxygen, hydrogen, ammonia, nitrogen, argon, nitrous oxide, and other gases.

Layerava® PE ALD P4/P8/P12 Models

  • Heated substrate typically up to 300 °C (optionally up to 700 °C)
  • Configurable to 100 mm, 200 mm, and 300 mm substrate sizes and stainless-steel reactor chamber
  • Solid/liquid/gas precursors delivery with heated gas distribution lines
  • Up to 8 precursor lines that are individually heated to 200 °C
  • High aspect ratio 3D Surround Coat™ for high surface area coating
  • Up to 4 MFC controlled plasma gas manifold (completely GUI/recipe integrated)
  • Hollow cathode plasma source up to 600 W
  • Precursor bottle consumption tracking and depletion warning system (PDEP)
  • 100% automated with recipe control and easy-to-use GUI
  • Top-notch scientific support team and recipe library


  • Automatic or manual load lock
  • Ozone process completely integrated with software package, and automated
  • RF substrate bias
  • In-situ QCM thickness monitor
  • In-situ ellipsometer optical metrology and optical ports

In-situ ellipsometer signal showing separate components of a single ALD cycle, including desorption, chemisorption, and ligand removal.

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