Water Vapor Desorption System Ideal for Viton O-Ring Sealed Vacuums

The UHV compatible UVB-100 Water Vapor Desorption System from RBD Instruments is suitable for large O-ring sealed vacuum systems and load locks. The system desorbs layers of water vapor by using low temperature UV 185 nm radiation, instead of the powerful heat of IR or a radiant bakeout.

In the case of high vacuum systems, faster pump-down times translate into more process runs and better productivity.  The UVB-100 is a low temperature water vapor desorption solution that is suitable for many vacuum chambers that cannot take the heat of IR or a traditional radiant bakeout.

In production systems, the UVB-100 offers faster critical pressure, and faster elimination of desorbed water during pumpdown.

For extra safety during the use of the UVB-100, a handheld, user-friendly battery-driven UV-C Meter is available as an optional purchase.

Flange Mounting

Flange Mounting*: 2.75 CF (top) or NW40 (K150) KF (bottom). Image Credit: RBD Instruments

* Other flange mounts are available on request.

Technical Information

Theory of Operation

It is possible to desorb layers of water vapor molecules on the inner side of vacuum chambers by energizing them with UV radiation in the range of 185 to 200 nm, which offers adequate energy to split covalent bonds. The graphs below reveal the effect of UV energy on hydrogen, water, oxygen, and carbon dioxide.

The UVB-100 Water Vapor Desorption System

Image Credit: RBD Instruments

The UVB-100 Water Vapor Desorption System

Image Credit: RBD Instruments

Here, the UV emitter was operated for 8 minutes and then switched OFF. From the graphs, it can be seen that the water vapor desorption rate grew during the UV ON time, and then declined considerably when the UV was switched OFF.

The second graph illustrates an increase in hydrogen and a substantial increase in carbon dioxide, as well as a drop in oxygen during the UV ON time, and an equivalent drop in hydrogen and carbon dioxide when the UV was switched OFF. The carbon dioxide will differ with the quantity of hydrocarbon available for reaction with O-free radicals and O3.

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