The PlasmaPro 800 from Oxford Instruments is a versatile solution for performing plasma enhanced chemical vapor deposition (PECVD) processes on large batches of wafers, and wafers measuring 300 mm. The PlasmaPro 800 system is an open-loading system with a compact footprint.
The system includes a large wafer platen that enables production-scale batch processing and handling 300 mm wafers.
- Accurate process control
- High-performance processes
- Established processes for 300 mm single-wafer failure analysis
- Excellent control of substrate temperature
Overview
The PlasmaPro 800 includes a table with a diameter of 460 mm, thereby providing full 300 mm or large batch 43 mm x 50 mm (2″) capacity. This feature offers complete production solutions, thus establishing the PlasmaPro 800 system as a well-proven, industry-leading product.
Image Credit: Oxford Instruments Plasma Technology
Image Credit: Oxford Instruments Plasma Technology
Image Credit: Oxford Instruments Plasma Technology