Plasma Enhanced Chemical Vapor Deposition System - PlasmaPro 800

The PlasmaPro 800 from Oxford Instruments is a versatile solution for performing plasma enhanced chemical vapor deposition (PECVD) processes on large batches of wafers, and wafers measuring 300 mm. The PlasmaPro 800 system is an open-loading system with a compact footprint.

The system includes a large wafer platen that enables production-scale batch processing and handling 300 mm wafers.

  • Accurate process control
  • High-performance processes
  • Established processes for 300 mm single-wafer failure analysis
  • Excellent control of substrate temperature

Overview

The PlasmaPro 800 includes a table with a diameter of 460 mm, thereby providing full 300 mm or large batch 43 mm x 50 mm (2″) capacity. This feature offers complete production solutions, thus establishing the PlasmaPro 800 system as a well-proven, industry-leading product.

The PlasmaPro 800

Image Credit: Oxford Instruments Plasma Technology

The PlasmaPro 800

Image Credit: Oxford Instruments Plasma Technology

The PlasmaPro 800

Image Credit: Oxford Instruments Plasma Technology

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