Physical Vapor Deposition - Multiple Layer or Co-Deposition PVD - Covap Series

The Covap series offers a compact, economical yet still robust solution for many process applications.  Designed for the lab that requires a safe and reliable tool that produces repeatable, high quality thin films in a compact footprint.

Built to our high quality standards, Covap is available with closed loop co-deposition control, recipe storage and a unique rectangular clam-shell chamber for improved accessibility (even when integrated with optional glovebox).

Deposition sources are isolated to reduce thermal effects and cross contamination and it is equipped with a complete set of removable chamber shielding to ensure the chamber can be easily cleaned and maintained.  Source and stage power, as well as pneumatic pressure are cut while the chamber is open, ensuring the highest level of safety.  

Covap has an intelligently designed control interface allowing new users to quickly become independent operators.  The intelligently designed control allows for multiple layers, and sequential or co-deposition, all with excellent repeatability. Substrate fixturing supports up to 100mm x 100mm samples in a chamber that achieves high vacuum via a turbo-molecular pump, and can accommodate either 2 or 4 thermal-resistive sources.  All this in a compact 600mm x 1000mm system footprint.  

Covap is backed by a 1-year warranty supported by the most responsive support team in the industry, grounded by Angstrom Engineerings 8-hour customer response guarantee.  

Covap may be small, but it is mighty.

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Customer Testimonial:  

Out of all the systems I have used, yours is by far the most reliable, consistent, and easy to use.

Dr. Marc Baldo - MIT

 

 

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