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Inline Doping Ultrasonic Spray System from Sono-Tek

This video shows the ultrasonic spray systems from Sono-Tek. This system reduces the manufacturing equipment costs. The ChemiCoat Si is a cost effective alternative to tube furnace boron diffusion for P-type silicon or POCL doping for N-type silicon wafers. It provides uniform thin films of Boric acid onto P-type wafers or phosphoric acid onto N-type wafers prior to inline diffusion furnace processes.

Run Time – 3:05min

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