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Results 811 - 818 of 818 for Chemical vapor deposition
  • Zirconium Nitride ( ZrN ) - Properties and Applications
    Article - 12 Jan 2004
    Zirconium Nitride (ZrN) is a hard refractory ceramic material. It is used as a hard coating for machine tools such as drill bits. Properties for Zirconium nitride are provided.
  • Special Applications with Tungsten
    Article - 15 Feb 2002
    Cobalt-chromium-tungsten alloys often referred to as stellite, are a group of wear-resistant alloys with applications where a tough wear-resistant material is necessary.
  • Tungsten Carbide - An Overview
    Article - 21 Jan 2002
    Scheele discovered “Tungsten” in 1781; however, it took 150 years more before the efforts of Scheele and his successors led to the use of tungsten carbide in the industry.
  • Aluminium - The Resource
    Article - 23 Apr 2001
    Aluminium is one of the most abundant elements in the earths crust. The extraction, refining and environmental impacts of these processes are considered, as are recycling, and future product and...
  • An Introduction to Materials on Display
    Article - 11 Apr 2001
    This article looks at technologies that have been used for displays for video output. The materials and technologies associated with emerging technologies such as LCD's, PDP's, FED's are described as...
  • Zirconium Carbide (ZrC)
    Article - 3 Apr 2001
    The lack of a fully developed, commercially viable sintering process has limited the use of zirconium carbide (ZrC) in engineering applications.
  • Alloys with New Antibacterial Coating to Promote Bone Growth
    Article - 18 Oct 2021
    Orthopedic implant surgeries including artificial joint replacement, spinal instrumentation, and fracture repair are becoming frequent. While such procedures can improve the quality of life, they have...
  • Characteristics of Al,F Co-Doped ZnO Thin Films Grown by rf Magnetron Sputtering with a Mesh Grid Electrode
    Article - 11 Dec 2007
    In this study, in order to decrease film resistivity, co-doping of fluorine (F) to ZnO:Al film was attempted using rf magnetron sputtering apparatus with the mesh grid electrode. The contamination of...

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