News - 17 Jun 2016
Industry-First Achievement Advances Realization of Sub-10nm Technology Nodes
Today, at the 2016 Symposia on VLSI Technology & Circuits, nano-electronics research center imec presented...
News - 15 Jun 2012
At this week's VLSI Technology Symposium (Honolulu, Hawaii, USA), imec presents significant improvements in performance and reliability of RRAM cells by process improvements and clever...
Article - 30 Jun 2020
Discover the advantages and analysis of using white light interferometry to characterize CMP processes.
News - 28 Feb 2005
Device features on computer chips as small as 40 nanometers (nm) wide—less than one-thousandth the width of a human hair—can now be measured reliably thanks to new test structures...
News - 17 Jun 2008
A low-power microchip developed at the University of Michigan uses 30,000 times less power in sleep mode and 10 times less in active mode than comparable chips now on the market.
News - 21 Aug 2007
Building on their successful CMOS solution for gate-first, thermally stable, high-k dual metal gates, SEMATECH researchers have released further data that portends a new era in which future transistor...
Article - 16 Feb 2002
The only material that is practically used for electron emitters is tungsten. Although there are other electropositive metals that yield higher emission rates, tungsten has an extremely low vapor...
Article - 15 Sep 2020
In this interview, Gareth Powell, strategic marketing manager at Teledyne e2v, speaks to AZoM about how the 2M Mipi Optical Module can reduce the time and cost of development in AI and ADC...