Metallic Components for Ion Implantation

Implantation of ions is a vital process in the production of semiconductors. In order to alter the conductivity, crystal structure and other properties of materials, wafers are usually doped by implanters with “foreign atoms”. The core of an implanter system is the beam path, in which the ions are generated, concentrated, accelerated and directed toward the wafer at great speeds.

Aggressive process gases, powerful electromagnetic fields, strong mechanical forces and temperatures of up to 1,400°C can cause multiple issues in conventional materials. Conversely, PLANSEE’s components, made from molybdenum, ceramics, graphite or tungsten, offer excellent resistance to heat.

Their resistance to corrosion, high thermal conductivity, absolute purity and material strength combine to allow these components to excel, and 100 or more PLANSEE metallic components can be found at work in each beam path. These components ensure that the ions are free from contaminants, are produced efficiently, and directed to the wafer along the path of the beam.

PLANSEE has over thirty years of experience in the semiconductor industry, and the components manufactured by the company at their sites in Japan and the USA are compliant with OEM standards.

PLANSEE considers the original spare parts of equipment manufacturing when optimizing shapes and material compositions, which ensures reduced costs of cleaning, increased service life, simpler installation and removal of components, less downtime, and a decrease in maintenance work required.

PLANSEE recognizes that reproducible quality for process is vital, and as such, develops advanced materials, and takes care of each element of the manufacturing process, from the metal powder, right through to the completed product.

The following products are available through PLANSEE for the semiconductor industry:

  • Cathodes (molybdenum, tungsten and alloys)
  • Chambers (molybdenum, graphite, tungsten and alloys)
  • Arc slits (molybdenum, graphite, tungsten and alloys)
  • Filaments (tungsten and tungsten alloys)
  • Holders (molybdenum, tungsten and alloys)
  • Analyzer components (graphite)
  • Insulators (ceramics)
  • End station (graphite)
  • Spare parts (molybdenum, graphite, tungsten and alloys, steel, ceramics)

Reducing Costs with PLANSEE MRS Vanes

Where there is potential to improve standards, as well as lowering cost and time-commitments, PLANSEE can offer customers advanced standard solutions, with improved and inexpensive spare parts available for customer use.

MRS plate in compliance with the OEM standard

MRS plate in compliance with the OEM standard

Improved design for a longer service life

Improved design for a longer service life

Throughout the process of ion implantation (IIP), the ions do not have the correct charge or mass, and are thus filtered out by the MRS vane, with only the ions traveling via the mass resolution slot able to follow the beam path to the wafer.

The MRS vane incurs abrasions when the ion beam collides, but this is minimized by an angle at the side facet. However, where chemical reactions and wear are involved with the IIP process, the greater they are, the more severe the angles at the corresponding surfaces. In regular practice, a 92° angle is used in the OEM standard part.

PLANSEE does, however, take care to additionally enhance the original component by building the area where the ion’s beam hits with the greatest force at almost a right angle. Conversely, the areas at the edge, typically affected only by thermal and chemical reactions, are produced with shallow angles only.

PLANSEE is highly discerning in regards to the materials that they use, in order to guarantee that the right product is delivered to clients. Traditional graphite can incur high levels of particle formation during processing, as a result of its coarse-grained structure. This type of impurity can cause serious issues in electrical parts with small-scale structures.

In order to avoid such issues, PLANSEE offers a firm and durable graphite, which is less disposed to abrasion, and therefore reduces formation of particles during the process.

A Single Source for All Your Needs

In order to guarantee that clients enjoy top quality products, PLANSEE handles all stages of product development, from raw materials, through to the end product.

This information has been sourced, reviewed and adapted from materials provided by PLANSEE.

For more information on this source, please visit PLANSEE.

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