Tegal Corporation has announced that a major European integrated device manufacturer has placed a multiple system order which includes a 6540 advanced plasma etch system, as well as multiple 980 ACS and 900 Series plasma etch systems. The systems will be used in the production of high-K decoupling capacitors incorporated into cell phones and other wireless devices.
“The unique ability of our advanced 6540 etcher to handle difficult-to-etch materials makes it an ideal choice for wireless device makers worldwide,” said Steve Selbrede, Vice President and Chief Technology Officer of Tegal Corporation. “High-K materials are increasingly being used in multi-chip module and system-on-chip devices in order to isolate or decouple the chip frequencies from surrounding noise. We have been working with several types of high-K materials for many years and have unique, patented technology to address the many problems encountered in the etching of these devices.”
“Our long relationship with this customer continues to strengthen,” said Thomas Mika, President and CEO of Tegal. “We are gratified to be included in both their production lines as well as in some of their most advanced development programs.”
The Tegal 6540 is a high-density plasma etch tool featuring the unique Hre-™ reactor, and Tegal's patented dual-frequency RF power technology and magnetic plasma confinement. The system is a critical enabler for etching new materials such as noble metal electrodes and capacitor structures, as well as ferroelectric, high-K dielectric, compound semiconductor and interconnect materials. The 980ACS and 900 series etch tools are some of the most cost-effective solutions for high-throughput etch applications.
http://www.tegal.com/
Posted 8th April 2005
