Oxford
Instruments Plasma Technology (OIPT) has recently won a contract with French
research centre, STnano in Strasbourg, France for the supply of a Plasmalab
System80 Plus ICP system.
Oxford Instruments Plasma Technology’s Plasmalab80 Plus ICP System
STnano is the new Strasbourg nanofabrication platform, established jointly by
IPCMS (a CNRS lab) and University of Strasbourg (UdS), and has expertise in the
design of nanostructures through top-down methods, and the study of their
magnetic properties.
Oxford Instruments' Plasmalab System80Plus system is a flexible, compact and
economical solution for plasma etching and deposition processes. STnano has
purchased the inductively coupled plasma (ICP) configuration, to process
multiple materials including Silicon etch.
OIPT's Plasmalab System80Plus is also available configured for etching and
deposition (ICP-PECVD), reactive ion etching (RIE), plasma etching (PE) or
plasma enhanced chemical vapour deposition (PECVD).
Dr. Hicham Majjad, Nanofabrication Manager at STnano, says that research
centre chose an Oxford Instruments tool as it fitted their research
requirements. "As a leading French research centre we demanded the highest
specification system we could find to fit the specifications for the work we are
undertaking. The Plasmalab80 Plus open load design allows for fast loading and
unloading, ideal for prototyping and low volume production environments such as
ours.
The system has been bought as part of the STnano's programme to equip our
cleanroom with state of the art instrumentation for nano and micro scale
fabrication in the fields of molecular electronic, spintronic, and
polymers."
"As world leaders in supplying etch tools to the Nano community, coupled with
our expertise in process technology, OIPT was able to offer STnano precisely the
System they were looking for," comments Mark Vosloo, Sales Director at OIPT, "We
pride ourselves on our experienced team of process engineers, able to offer
processes and techniques in order to support our customers exacting
requirements."