The EVG®610 mask alignment system from EVG Group supports a wide range of standard lithography processes, like soft-, hard-, vacuum-, and proximity exposure modes, including the option of back-side alignment. Furthermore, the system provides extra abilities such as bond alignment and nanoimprint lithography (NIL).
The EVG®610 enables rapid processing and re-tooling for varying user needs with a transition time of less than a few minutes. Its modern multi-user concept can be adapted right from beginners to experts, thereby making it perfect for universities and R&D applications.
Features
- Top-side and bottom-side alignment ability available
- Wafer or substrate size from pieces ranging up to 200 mm/8″
- Stepwise process guidance is provided
- Automated wedge compensation sequence is available
- Comes with high-precision alignment stage
- Reduced system footprint and facility needs
- Motorized and recipe-controlled exposure gap
- Supports the new UV-LED technology
- Availability of remote technology support
- Agile processing and conversion re-tooling available
- Multi-user concept (limitless number of user accounts and recipes, different user interface languages, and assignable access rights)
- Table-top or autonomous version available with anti-vibration granite table
- Additional capabilities:
- Nanoimprint lithography (NIL)
- IR alignment
- Bond alignment
Technical Data
| . |
. |
| Alignment modes |
Top side alignment: ≤ ±0,5 µm
Bottom side aligment: ≤ ±2,0 µm
IR alignment: ≤ ±2,0 µm / substrate material depending
Bond alignment: ≤ ±2,0 µm
NIL alignment: ≤ ±2,0 µm |
| Exposure source |
Mercury light source / UV LED light source |
| Wedge compensation |
Fully automatic - SW controlled |
| Wafer diameter (substrate size) |
Up to 100 / 150 / 200 mm |
| Exposure setup |
Vacuum contact / hard contact / soft contact / proximity mode |
| Exposure options |
Interval exposure / flood exposure / sector exposure |
| Advanced alignment features |
Manual alignment / in-situ alignment verification
Manual cross correction
Large gap alignment |
| System control |
Operation system: Windows
File sharing and back-up solution / unlimited no. recipes and parameters
Multi-language user GUI & support: CN, DE, FR, IT, JP, KR
Real-time remote access, diagnostics & troubleshooting |
| Nanoimprint lithography technology |
UV-NIL |
Source: EV Group