Secondary Ion Mass Spectrometry (SIMS) RSS Feed - Secondary Ion Mass Spectrometry (SIMS)

Secondary ion mass spectrometry (SIMS) is a technique used in materials science and surface science to analyze the composition of solid surfaces and thin films by sputtering the surface of the specimen with a focused primary ion beam and collecting and analyzing ejected secondary ions.
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Equipment
The CAMECA NanoSIMS 50 is a unique ion microprobe optimizing SIMS analysis performance at high lateral resolution. It is based on a coaxial optical design of the ion gun and the Secondary ion extraction, and on an original magnetic sector mass analyzer with multicollection.
The IMS 1280 is based on a double focusing mass spectrometer with a large radius magnetic sector. The secondary ion optics has been optimized to work at full transmission up to 6,000 mass resolving power. Together with high density cesium or oxygen primary ion beam bombardment, this allows isotopic analysis of trace elements at high sensitivity (e.g. mandatory for Pb analyses in Zircon).
The Hiden SIMS Workstation has been developed with strong interaction with those used to performing SIMS analyses for both contract service work and research in many fields of analysis.
The CAMECA SC Ultra has been specifically designed to meet the increasing needs for dynamic SIMS measurements in advanced semiconductors. The design of the CAMECA SC Ultra is quite unique: along with the CAMECA IMS Wf, it is the only SIMS instrument offering EXtreme Low Impact Energy capabilities with no compromise on high mass resolution and high transmission.