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Plasmas generated by RF, DC, microwave and pulsed methods are used both in research and industrial applications to produce such things as semiconductors. To ensure the process is accurate and repeatable plasma dignotic toools are used to measure and characterise plasma parameters such as density, uniformity and electron temperature of the plasma.
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Equipment
The Hiden ESPion probe can be used for regular monitoring of the I-V plasma characteristic, which provides direct data relating to plasma reproducibility and stability.
The Hiden EQP system is a combined mass spectrometer and energy analyser manufactured to handle the analysis of plasma ions, neutrals and neutral radicals.