Equipment | Plasma Processing

Plasma Processing

Equipment
Smart Probe/Langmuir Probe from Scientific Systems
SmartProbe from Scientific Systems is the world's leading commercial Langmuir probe system and is used to measure a wide range of plasma parameters such as plasma density, uniformity and electron temperature distribution.
PlasCalc Plasma Monitoring + Control Systems from Ocean Optics
The PlasCalc Plasma Monitoring System from Ocean Optics can determine plasma emission from 200 to 100 nm in just 3 milliseconds.
Reactive Ion Etch System - Phantom III from Trion Technologies
The Phantom III RIE (reactive ion etch system) is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries.
EQP - Mass and Energy Analyser for Plasma Diagnostics by Hiden Analytical
The EQP mass spectrometer combines an electrostatic sector energy analyser with a high performance quadrupole mass filter in an instrument designed for plasma diagnostics. The EQP can acquire the mass spectra and energy distributions of neutrals, radicals and ions (positive and negative). Trends in intensity can be plotted against time. Fast acquisition modes mean that transients and afterglows can be studied.
Compact Plasma Cleaning System - The Apollo from Trion Technologies
The Apollo plasma cleaning system is a compact, inexpensive and versatile system, which can handle 100-300mm wafers. By employing either ICP or microwave and RF bias power as needed, difficult to remove layers of resist can be removed at low temperatures.
Plasma Enhanced Chemical Vapor Deposition (PECVD) System - Orion III from Trion Technologies
The Orion III Plasma Enhanced Chemical Vapor Deposition (PECVD) system from Trion Technologies produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels.
Plasma Etching System - Sirus T2 Tabletop Reactive Ion Etcher (RIE) from Trion Technologies
The Sirus T2 Reactive Ion Etcher (RIE) from Trion Technologies is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment.
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