Instruments Plasma Technology (OIPT), leader in producing systems and
processes for etch, deposition and growth, has recently received an order from
IMB Barcelona for its System100 cluster platform with two ICP-RIE process
modules. The systems will be used for Aluminium etching, one of Oxford
Instruments areas of expertise.
The National Centre for Microelectronics (CNM) is the largest public
microelectronics research and development centre in Spain, and comprises three
Institutes, including the Instituto de Microelectrónica de Barcelona,
Dra. Ana Sánchez Amores from IMB Barcelona commented, "At IMB-CNM, our
facilities include an Integrated Micro and Nanofabrication clean room and other
complementary laboratories for microsystems processes, device packaging and
electrical characterisation. The cleanroom facility of IMB-CNM includes
equipment for micro and nanofabrication processes based on silicon technology,
and we will be using the OIPT Systems here for our R&D. We chose OIPT
Systems as a result of a public tender process where different items have been
evaluated, namely technical and economical aspects, etch process expertise with
proven Systems and level of customer support offered".
OIPT's Sales and Customer Support Director, Mark Vosloo said, "Oxford
Instruments' tools offer excellent uniformity and high-throughput processes on a
range of applications. Our flexible cluster systems are suitable both for
R&D such as the IMB cleanroom installation, and for Production applications,
and are backed by our extensive process library. As leaders in the industry we
are delighted our systems were chosen by this prestigious Institute."