Oxford Instruments Plasma Technology has just completed its series of Asian seminars in Beijing, China and Hsinchu, Taiwan, attracting a record total attendance of over 250 people.
The seminar in Beijing was co-hosted by the eminent Institute of Semiconductors, Chinese Academy of Sciences (IOS-CAS) one of the most important bases for the research and development of semiconductor science and technology in China, whilst its counterpart in Taiwan was co-hosted by ITRI, Taiwan’s leading non-profit R&D organisation with over 5,800 employees.
Both seminars featured a range of International and national speakers including Prof. Yang Fuhua from IOS-CAS in China and Prof. Chyi, Jen-Inn, Executive Vice President, National Applied Research Laboratories in Taiwan; with the talks covering a number of key areas including GaN on Si power device development, SiC wide bandgap semiconductors for power electronics applications and MEMS devices, processes and trends.
Dr. Shao-Chung Hsu, Executive Director of ITRI South Campus gave a welcome address at ITRI, and commented, “At ITRI we actively encourage our collaborations with leading industrial companies, and are delighted to join Oxford Instruments this week and hold such an informative conference.
ITRI’s Plasma Processing Seminar attracted customers from ITRI and throughout Taiwan.
Oxford Instruments has an excellent cleanroom facility established here at ITRI so it is fitting for us to host an event covering the wide range of applications that the Oxford Instruments systems can offer including MEMS, HBLED, ALD and III-V. Talks about the recent progress in their research and development and future trends in the fabrication and applications in micro and nano structures, gave the audience from academia and industry much opportunity for discussion. We hope to hold more events like this with Oxford Instruments at ITRI.”
Frazer Anderson, Business Group Director at Oxford Instruments Plasma Technology introduced the company at both seminars and summarises the company’s pleasure at the events’ success last week, “These technical seminars in China and Taiwan gave us and our audiences a great opportunity to spend time being updated by a wide range of eminent speakers, in a relaxed atmosphere where we can share experiences and learn more from our peers. As a company our ethos is to use innovation to turn smart science into world class products, and by working closely with partners at the top of their field and learning about their evolving requirements, their research and technological developments, we hope to achieve this.”
About Oxford Instruments plc
Oxford Instruments designs, supplies and supports high-technology tools and systems with a focus on research and industrial applications. It provides solutions needed to advance fundamental physics research and its transfer into commercial nanotechnology applications. Innovation has been the driving force behind Oxford Instruments' growth and success for over 50 years, and its strategy is to effect the successful commercialisation of these ideas by bringing them to market in a timely and customer-focused fashion.
The first technology business to be spun out from Oxford University over fifty years ago, Oxford Instruments is now a global company with over 1900 staff worldwide and is listed on the FTSE250 index of the London Stock Exchange (OXIG). Its objective is to be the leading provider of new generation tools and systems for the research and industrial sectors.
This involves the combination of core technologies in areas such as low temperature, high magnetic field and ultra high vacuum environments, Nuclear Magnetic Resonance, X-ray, electron and optical based metrology, and advanced growth, deposition and etching.
Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology. Its products, expertise, and ideas address global issues such as energy, environment, security and health.
About Oxford Instruments Plasma Technology
Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for the etching of nanometre sized features, nanolayer deposition and the controlled growth of nanostructures.
These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition, deep silicon etch and physical vapour deposition. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.