Posted in | Materials Processing

Oxford Instruments Plasma Technology Announce Ion Beam and ALD Workshop at UCSB

Continuing their informative and educational series of global plasma seminars and workshops, Oxford Instruments Plasma Technology, together with UC Santa Barbara, CA, USA will hold a technical workshop addressing latest developments in ALD and Ion Beam etch and deposition on 12th November 2013.

The 1 day event, hosted by UCSB will include presentations from Users and Oxford Instruments specialists, discussions, a poster session focussing on latest technical innovations, and a networking lunch. Experts from Oxford Instruments & UCSB will present latest process and applications developments, and there will be ample time for discussion.

Presentation topics currently include:

  • An introduction to plasma and thermal ALD techniques
  • ALD hardware developments
  • An introduction to ion beam technology
  • Ion beam etch – a users perspective
  • Ion beam developments
  • ALD process (Metal & nitride ALD)
  • ALD – a user’s results
  • Ask the experts, Q & A & ion beam & ALD process posters

Bill Mitchell from UCSB said, ”We look forward to this latest workshop with Oxford Instruments, the last one here was extremely well attended and provided a great deal of useful information and advice to our Users and visitors from outside UC Santa Barbara. The mix of fundamentals with more advanced process information in the programme will interest a wide cross section of our community.”

“This workshop is a great opportunity for a wide range of scientists in research and manufacturing to discover practical aspects of ALD and Ion Beam processes, technologies and applications, straight from a leading manufacturer with over 30 years in the industry”, comments Michelle Bourke, Business Group Director at Oxford Instruments Plasma Technology, “Delegates appreciate the informal workshop atmosphere of these events, encouraging delegates to participate through open discussion and sharing their questions and experiences.”

About Oxford Instruments plc

Oxford Instruments designs, supplies and supports high-technology tools and systems with a focus on research and industrial applications. It provides solutions needed to advance fundamental physics research and its transfer into commercial nanotechnology applications. Innovation has been the driving force behind Oxford Instruments' growth and success for over 50 years, and its strategy is to effect the successful commercialisation of these ideas by bringing them to market in a timely and customer-focused fashion.

The first technology business to be spun out from Oxford University over fifty years ago, Oxford Instruments is now a global company with over 1900 staff worldwide and is listed on the FTSE250 index of the London Stock Exchange (OXIG). Its objective is to be the leading provider of new generation tools and systems for the research and industrial sectors.

This involves the combination of core technologies in areas such as low temperature, high magnetic field and ultra high vacuum environments, Nuclear Magnetic Resonance, X-ray, electron and optical based metrology, and advanced growth, deposition and etching.

Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology. Its products, expertise, and ideas address global issues such as energy, environment, security and health.

About Oxford Instruments Plasma Technology

Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for the etching of nanometre sized features, nanolayer deposition and the controlled growth of nanostructures.

These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition, deep silicon etch and physical vapour deposition. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Oxford Instruments Plasma Technology. (2019, February 09). Oxford Instruments Plasma Technology Announce Ion Beam and ALD Workshop at UCSB. AZoM. Retrieved on July 19, 2019 from https://www.azom.com/news.aspx?newsID=38560.

  • MLA

    Oxford Instruments Plasma Technology. "Oxford Instruments Plasma Technology Announce Ion Beam and ALD Workshop at UCSB". AZoM. 19 July 2019. <https://www.azom.com/news.aspx?newsID=38560>.

  • Chicago

    Oxford Instruments Plasma Technology. "Oxford Instruments Plasma Technology Announce Ion Beam and ALD Workshop at UCSB". AZoM. https://www.azom.com/news.aspx?newsID=38560. (accessed July 19, 2019).

  • Harvard

    Oxford Instruments Plasma Technology. 2019. Oxford Instruments Plasma Technology Announce Ion Beam and ALD Workshop at UCSB. AZoM, viewed 19 July 2019, https://www.azom.com/news.aspx?newsID=38560.

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Submit