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  • Supplier Profile
    Oxford Instruments Plasma Technology is a Leading Provider of Etch and Deposition Processing Solutions Plasma technology is used in the fabrication of most semiconductor devices created today...
  • Supplier Profile
    Trion Technology, Inc. is the largest domestic US supplier of custom Plasma Etch and Deposition Equipment for over 20 years. We also have a significant presence in Asia with equipment in Japan,...
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    ECI Technology is a leading provider of chemical process control equipment for the microelectronics industry. ECI systems are found throughout the fabs ‒ qualifying incoming supplies, managing...
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    Malvern Panalytical technologies are used by scientists and engineers in a wide range of industries and organizations to solve the challenges associated with maximizing productivity, developing better...
  • Supplier Profile
    We are an experienced, dynamic and expanding company already established as a leading UK manufacturer of plasma treatment systems for cleaning, activation and coating. Our success is built around an...
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    Metrohm is a worldwide leading manufacturer of precision instruments for chemical analysis. In the field of electrochemical ion analysis we have been the unchallenged world number one for many years....
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    Jet Edge has been at the forefront of designing and manufacturing ultra-high-pressure waterjet pumps and motion systems since the technology came on-line for industrial applications. We take our...
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    TOFWERK is making the world a cleaner place through innovative solutions for chemical analysis. Our scientists and engineers design, manufacture, and optimize high performance mass spectrometers for...
  • Article - 15 Oct 2012
    This article reviews the applications and advantages of using Ion Beam technology for etching processes compared to technology such as plasma etching.
  • Article - 20 Jul 2006
    Metallographic etching is the process of revealing microstructural details that would otherwise not be evident on the as-polished sample. The various etching processes are described.

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