Coating Deposition

Equipment
Dynavac is distinguished in the Astronomical Telescope Community for its ability to design, construct and install large mirror deposition systems.
The DiamoTek 700 Series Microwave Diamond CVD systems incorporate tunable resonant cavity technology offering proven diamond deposition capability with high efficiency and control.
The OFT EDGE Series of modular systems offered by VG Scienta includes devices that can be configured for depositing and evaluating organic and inorganic layers on solid and flexible substrates for device production.
Oxford Instruments has introduced a new, compact open-load system that has been specifically designed for Atomic Layer Deposition (ALD).
The PlasmaPro System400 is used for single-wafer or batch PVD processing and offers the flexibility of pulsed dc, dc, rf and reactive magnetron sputtering. It finds applications in production or research & development.
MBRAUN thin film deposition systems are engineered for use in university research, as well as in large-scale industrial applications. We offer both standard and custom thin film deposition systems.
Dynavac's Spectrum-Pro Optical Monitoring System is a valuable tool for producing complex, repeatable coatings with a high degree of accuracy.
The PlasmaPro Estrelas 100 has been launched recently by Oxford Instruments. The system offers excellent process performance.
The Nanofab 800Agile offers excellent growth of nanowires and nanotubes with in situ catalyst activation and thorough process control.
Oxford Instruments has launched the PlasmaPro 100 Etch and Deposition tool which is a highly configurable system.
ReelCoater is a high-productivity PVD system from Impact Coatings, paving the way to new surface treatment applications in the electronics industry as well as in other industries.
The Scientific Materials and Applied Research Tool (SMART) platform is a versatile deposition system that is engineered for today's thin films deposition research applications.
The addition of the Voyager to Denton Vacuum's range of deposition platforms provides the thin film specialist with the ability to deposit a variety of films previously difficult to produce due to the geometry of the part or the extended deposition period required.
The Optofab3000 includes high reflective and anti reflective coatings and is configured similar to the Ionfab300Plus.
The PlasmaPro 800Plus is a flexible solution for plasma etching and deposition processes on large and 300-mm wafer batches, in a compact footprint, open-loading system.
Oxford Instruments’ FlexAL product family provides a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition (ALD) processes and thermal ALD within a single system.
The PlasmaProNGP80 is a compact open-loading tool for plasma etch and deposition, offering a range of process technologies
The Oxford Instruments IonFab 300Plus provides the flexibility to conduct etching and/or deposition and maximize system utilization. The specifications of the system can be fine-tuned based on the specific application ensuring rapid and consistent process results.
The Covap II series offers a compact economical solution suitable for many process applications. Its small size will ensure you can find a space in your lab and in your budget.
MANTIS offers the QUAD-EV series mini e-beam evaporators that are specifically developed to allow controlled evaporation of materials under ultra-high vacuum (UHV) conditions.
Impact Coatings offers PlastiCoater 200, a PVD metallization unit that can be used an integrated production unit with an injection molding machine for the production of metallized plastic parts.
The Nexdep system from Angstrom Engineering offers custom flexibility in a compact footprint at an economical price The Nexdep system can be built to meet your requirements.
PlasmaPro System100 is a powerful and flexible system for deposition and plasma etching processes.
ULVAC offers a new Arc Plasma Deposition (APD) system, which is suitable for battery, fuel cell and catalyst research.
SVT Associates' NorthStarâ„¢ Atomic Layer Deposition (ALD) system is a versatile research deposition tool for thermal or energy enhanced ALD.
Expanding on the popularity of Anstrom Engineering's Åmod line, the EvoVac’s larger size allows even more configuration flexibility. Glove box integration is improved with its wider door opening and increased chamber height allowing for a greater source to substrate distance. The EvoVac line is for the researcher looking for more sources and flexibility in a deposition system.
The Amod line of thin film deposition tools was designed to meet the advanced process requirements of today's thin film researcher.
The InlineCoater 500 from Impact Coatings is an ideal PVD system for continuous production flows as it can handle small loads at a better throughput thanks to its unique design.
The InlineCoater 300 is a flexible PVD system from Impact Coatings that provides short cycle times in the range of 0.5-5 minutes for many different decorative and functional PVD coatings.
The TurboDisc® K465i™ GaN MOCVD System is the newest entry into Veeco's K-Series platform, which is production-proven and provides high productivity and for HB LED high-volume production fabs around the globe. The K465i achieves up to 90% yield (5nm bin) due to its superior uniformity and excellent run-to-run repeatability. K465i also offers the industry's highest productivity due to its full automation and shortened recovery period after maintenance.
Semicore, creators and manufacturers of precision thin film vacuum deposition systems and products effectively contribute to the quality, capabilities and economy of the SC250 & SC450.
For over 30 years, Dynavac has been delivering turnkey equipment solutions for large-scale production of thin films.
The SC 1500 inline sputtering system offers a modular, cost-effective and scalable design to satisfy the requirements of high-volume or pilot production.
The Triaxis sputtering system is created and developed by engineering talents at Semicore, a Silicon Valley-based manufacturer.
Oxford Instruments Plasma Technology has been a leading supplier of high-volume batch plasma tools in the production market for over 15 years, with a wide installed base of HB LED production systems in operation.
The Ionfab500Plus was designed mainly for ultra high quality optical thin films and was first delivered in the year 1983.
Oxford Instruments has launched an advanced etch and deposition tool called PlasmaPro System133 which delivers excellent performance for both research and development and production.
The Odyssey 450 Deposition System from Dynavac offers small-scale production with excellent quality results of a large sophisticated system.
The TriAxis electron beam evaporation system includes a 304 stainless steel cylindrical chamber with a typical size range 18 or 24 inch diameter and is scaled to match the specific application.
Impact Coatings offers PlastiCoater 400, a PVD metallization unit that is engineered to work in parallel with an injection molding equipment.
The Nanofab 700 Nanoscale Growth System offers superior growth of nanowires and nanotubes with in-situ catalyst activation and complete process control.
The low temperature organic deposition cell available from VG Scienta is an ideal source for research applications.
The Explorer® offers the widest range of configurations and deposition modalities in the thin film industry: Electron beam evaporation, resistance evaporation, sputtering, ion plating, and ion assisted deposition.
OpAL has launched an innovative thermal atomic layer deposition (ALD) tool with a clear and convenient upgrade route to plasma, offering both thermal and plasma ALD in one compact tool.
Thin Film System TFS 500 ALD reactor is designed for thin film processing, protective coating, functional surface buildup and doping purposes. Substrate alternatives include wafers and other planar substrates, powders and porous substrates and complex 3D substrates. TFS 500 can be equipped with a manual load lock for rapid wafer processing. Reactor operates in batch mode. Variable reaction chambers can be fitted to the reactor making it possible to optimize the reaction chamber design depending on the application.
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