Coating Deposition

Featured Equipment
The HEX modular deposition system available from MANTIS has been designed to deliver high performance and integrates the latest thin film technologies into a compact, bench top platform at reduced cost.
Other Equipment
The PlasmaPro 100 highly configurable and reactive ion etching (RIE) system from Oxford Instruments is provided with standalone process chambers comprising load locks or as cluster configurations on hexagonal or square transfer chambers.
The Nexdep system from Angstrom Engineering offers custom flexibility in a compact footprint at an economical price The Nexdep system can be built to meet your requirements.
The PlasmaPro 100 inductively coupled plasma chemical vapour deposition (ICPCVD) system is designed to produce high density dielectric films at low temperatures with the capability to deposit onto damage sensitive surfaces.
SVT Associates' NorthStar™ Atomic Layer Deposition (ALD) system is a versatile research deposition tool for thermal or energy enhanced ALD.
Oxford Instruments’ PlasmaPro 80 Stratum is a compact open-loading tool designed specifically for plasma enhanced chemical vapour deposition (PECVD).
PICOSUN™ R-series ALD systems are designed for highest quality R&D and small-scale pilot production. Hot-wall, top-flow, dual-chamber structure enables deposition of leading quality ALD films that meet the strictest uniformity and purity standards. PICOSUN™ ALD systems allow processing of all kinds of samples from wafers and 3D objects to challenging nanoscale structures such as high aspect ratio (HAR) trenches, through-porous samples, and nanoparticle powders.
For over 30 years, Dynavac has been delivering turnkey equipment solutions for large-scale production of thin films.
The PlasmaPro 800 offers a versatile solution for reactive ion etching (RIE) processes on large wafer batches and 300mm wafers.
The QBox series systems are based on a front-loading box-type chamber with all source ports using conflat flanges as standard.
ULVAC offers a new Arc Plasma Deposition (APD) system, which is suitable for battery, fuel cell and catalyst research.
TFS 1200, an application-specific system from Beneq, has been specifically designed for industrial in-line and batch production of buffer layer coatings on copper-indium-gallium-diselenide (CIGS) thin film solar cells.
The addition of the Voyager to Denton Vacuum's range of deposition platforms provides the thin film specialist with the ability to deposit a variety of films previously difficult to produce due to the geometry of the part or the extended deposition period required.
ReelCoater is a high-productivity PVD system from Impact Coatings, paving the way to new surface treatment applications in the electronics industry as well as in other industries.
The PlasmaPro Estrelas100 deep silicon etch technology, available from Oxford Instruments, has been designed to provide excellent process performance.
Oxford Instruments Plasma Technology has been a leading provider of high-volume batch plasma tools in the production market for more than 15 years, with a wide installed base of HBLED production solutions in operation.
The TriAxis electron beam evaporation system includes a 304 stainless steel cylindrical chamber with a typical size range 18 or 24 inch diameter and is scaled to match the specific application.
FCS 4000F, a heavy-duty production system from Beneq, has been specifically designed for in-line coating on float glass lines.
Impact Coatings offers PlastiCoater 200, a PVD metallization unit that can be used an integrated production unit with an injection molding machine for the production of metallized plastic parts.
The PlasmaPro 80 ICPCVD65 from Oxford Instruments is a compact open loading tool designed to handle plasma enhanced chemical vapour deposition (PECVD), and manufacture high quality uniform dielectric films.
The InlineCoater 500 from Impact Coatings is an ideal PVD system for continuous production flows as it can handle small loads at a better throughput thanks to its unique design.
The FlexAL systems from Oxford Instruments Plasma Technology offer a new range of flexibility and ability in the fabrication of nanoscale structures and devices by providing thermal atomic layer deposition (ALD) and remote plasma ALD processes inside a single ALD system.
The table top system includes a cylindrical chamber (250mm ID) and is based on a UHV conflat flange platform.
Oxford Instruments’ PlasmaPro 133 ICPCVD380 wafer system is a unique tool capable of producing outstanding uniformity and high rate films. The system can efficiently control film properties such as stress, refractive index, electrical features and wet chemical etch rate.
Dynavac's Spectrum-Pro Optical Monitoring System is a valuable tool for producing complex, repeatable coatings with a high degree of accuracy.
The CUSP magnetron sputter sources are the only commercially available sputter sources that are deep UHV (1x10-11Torr) compatible sources.
The InlineCoater 300 is a flexible PVD system from Impact Coatings that provides short cycle times in the range of 0.5-5 minutes for many different decorative and functional PVD coatings.
The PlasmaPro System133 is a reactive ion etch (RIE) wafer processing tool that is designed to handle up to 300mm single wafer and large batches. It provides exceptional uniformity and high throughput for numerous applications and outstanding performance for both R&D and production.
The P800 ALD system available from Beneq is industrially proven, reliable, and built on more than two decades of continuous operation in challenging industrial applications.
Dynavac is distinguished in the Astronomical Telescope Community for its ability to design, construct and install large mirror deposition systems.
The design of the PlasmaPro 100 Stratum PECVD system is such that it offers superior uniformity and high rate films.
The low temperature organic deposition cell available from VG Scienta is an ideal source for research applications.
The TFS 200R thin film system available from Beneq has been specifically designed for depositing thin films on flexible substrates.
The Q300TD dual target sputter coating system supplied by Quorum Technologies is a fully automatic unit designed for conductive coating of scanning electron microscopy (SEM) specimens and for thin film applications.
Expanding on the popularity of Anstrom Engineering's Åmod line, the EvoVac’s larger size allows even more configuration flexibility. Glove box integration is improved with its wider door opening and increased chamber height allowing for a greater source to substrate distance. The EvoVac line is for the researcher looking for more sources and flexibility in a deposition system.
The TFS NX300 thin film system from Beneq is specifically developed for fully-automated production of surface passivation on crystalline silicon (c-Si) solar cell wafers
The MGC-75 gas cracker makes use of a proprietary, capillary cracking tube for effective disassociation of molecular gases at relatively low temperatures.
The TurboDisc® K465i™ GaN MOCVD System is the newest entry into Veeco's K-Series platform, which is production-proven and provides high productivity and for HB LED high-volume production fabs around the globe. The K465i achieves up to 90% yield (5nm bin) due to its superior uniformity and excellent run-to-run repeatability. K465i also offers the industry's highest productivity due to its full automation and shortened recovery period after maintenance.
The Optofab3000 includes high reflective and anti reflective coatings and is configured similar to the Ionfab300Plus.
The SC 1500 inline sputtering system offers a modular, cost-effective and scalable design to satisfy the requirements of high-volume or pilot production.
The SonoPlot GIX Microplotter Desktop is a benchtop picoliter fluid dispensing solution specifically designed for the polymer electronics and microarray markets.
The Triaxis sputtering system is created and developed by engineering talents at Semicore, a Silicon Valley-based manufacturer.
Beneq offers the P400A ALD system, which is exclusively designed for large-scale production.
The Nanofab 800Agile offers excellent growth of nanowires and nanotubes with in situ catalyst activation and thorough process control.
The PICOPLATFORM™ vacuum cluster tools are multifunctional thin film processing cluster units that provide exceptional scalability and modularity. These tools provide parallel processing and sample handling in constant vacuum.
The Covap II series offers a compact economical solution suitable for many process applications. Its small size will ensure you can find a space in your lab and in your budget.
The PlasmaPro 100 Cobra inductively coupled plasma (ICP) etch system from Oxford Instruments is designed to handle ICP etching of dielectric, compound semiconductor, metals, and organic materials.
The RFMax ion sources use the extensive knowledge of Mantis Deposition in plasma technology.
Beneq and Glaston have lunched TFC2000, an off-line system designed for continuous production line system for TCO-coated glass.
Impact Coatings offers PlastiCoater 400, a PVD metallization unit that is engineered to work in parallel with an injection molding equipment.
CAPOS is a cost-effective, open platform design for accurate research and development and small batch production. CAPOS offers a number of custom formats and standard options. It was developed and created by engineering talents at Semicore and this innovative advancement extends capabilities as well as enables excellent levels of performance.
The PlasmaPro System400 is used for single-wafer or batch PVD processing and offers the flexibility of pulsed dc, dc, rf and reactive magnetron sputtering. It finds applications in production or research & development.
The DiamoTek 700 Series Microwave Diamond CVD systems incorporate tunable resonant cavity technology offering proven diamond deposition capability with high efficiency and control.
WCS-500, a Roll-to-Roll ALD Web Coating system from Beneq, provides accurate roll–to–roll ALD on flexible webs with a maximum width of 500 mm.
The PlasmaPro 800 Stratum from Oxford Instruments is large capacity, open loading plasma enhanced chemical vapour deposition (PECVD) system.
PICOSUN™ P-series is a new range of instruments designed for high volume batch atomic layer deposition (ALD) production.
The SC7620 sputter coater available from Quorum Technologies is a compact, low-cost sputter coater developed for SEM samples.
Oxford Instruments’ PlasmaPro 80 reactive ion etching (RIE) provides flexible reactive ion etch solutions on a single platform with suitable open loading option. It is a compact, small footprint device that is simple to set up and use without compromising on the quality of a process.
The Explorer® offers the widest range of configurations and deposition modalities in the thin film industry: Electron beam evaporation, resistance evaporation, sputtering, ion plating, and ion assisted deposition.
Mantis Deposition designs and manufactures a series of sample tables that can be fitted to standard NW200CF flange and can be incorporated into most deposition systems.
The Mantis Comcell effusion cell series is designed for high-precision, high-purity material evaporation in hybrid or MBE UHV applications.
Semicore, creators and manufacturers of precision thin film vacuum deposition systems and products effectively contribute to the quality, capabilities and economy of the SC250 & SC450.
The Scientific Materials and Applied Research Tool (SMART) platform is a versatile deposition system that is engineered for today's thin films deposition research applications.
The M series system is based on a UHV, conflat flange platform with a large metal-sealed top flange.
The Oxford Instruments IonFab 300Plus provides the flexibility to conduct etching and/or deposition and maximize system utilization. The specifications of the system can be fine-tuned based on the specific application ensuring rapid and consistent process results.
Oxford Instruments Plasma Technology has introduced an evolution in Batch Etch technology with the PlasmaPro1000 Astrea large batch etch system.
The Nanofab 700 Nanoscale Growth System offers superior growth of nanowires and nanotubes with in-situ catalyst activation and complete process control.
The OFT EDGE Series of modular systems offered by VG Scienta includes devices that can be configured for depositing and evaluating organic and inorganic layers on solid and flexible substrates for device production.
MATS sources generate an inductively coupled plasma for the disassociation of various gases that include nitrogen, oxygen, hydrogen and other molecular gases.
CCS CRIUS® II-L from AIXTRON is a high-throughput reactor that offers high performance at low cost of ownership. The process cycles are less time-consuming, which ensures high process yields.
The Amod line of thin film deposition tools was designed to meet the advanced process requirements of today's thin film researcher.
TFS 600, an application-specific ALD system from Beneq, has been exclusively developed for vacuum-line integrated OLED encapsulation.
Thin Film System TFS 500 ALD reactor is designed for thin film processing, protective coating, functional surface buildup and doping purposes. Substrate alternatives include wafers and other planar substrates, powders and porous substrates and complex 3D substrates. TFS 500 can be equipped with a manual load lock for rapid wafer processing. Reactor operates in batch mode. Variable reaction chambers can be fitted to the reactor making it possible to optimize the reaction chamber design depending on the application.
Oxford Instruments’ PlasmaPro 133 stratum single and multi-wafer plasma enhanced chemical vapour deposition (PECVD) system is exclusively designed to manufacture superior uniformity, high rate films, with the capacity to control film properties such as stress, electrical features, refractive index, and wet chemical etch rate.
SonoPlot offers GIX Microplotter II, a compact, precision picoliter fluid dispensing solution that is suitable for the polymer electronics and microarray markets.
MBRAUN thin film deposition systems are engineered for use in university research, as well as in large-scale industrial applications. We offer both standard and custom thin film deposition systems.
The PlasmaPro 133 Cobra380 380mm ICP etch tool is capable of handling wafer sizes up to 300mm. The tool is provided with carriers for multi-wafer batches.
Oxford Instruments has introduced a new, compact open-load system that has been specifically designed for Atomic Layer Deposition (ALD).
Ipsen offers Ivadizing System, an ion vapor aluminum deposition system that offers a practical option to cadmium plating used in the automotive and aerospace industries.
MANTIS Deposition offers a range of QPrep deposition systems that are suitable for sputtering and other thin film growing methods.
The PlasmaPro 80 Cobra65 ICP etch system from Oxford Instruments provides flexible plasma etch and deposition solutions on a single platform with easy open loading option.
TBS-2-800 thermal boat sources are designed for light thin film metal evaporation. The thermal boat sources are designed with all-metal vacuum seals and can be fully baked till 250°C and are UHV compatible.
The PlasmaPro 100 Sapphire, available from Oxford Instruments Plasma Technology, is the latest breakthrough in single wafer etch technology.
The Odyssey 450 Deposition System from Dynavac offers small-scale production with excellent quality results of a large sophisticated system.