Equipment | Coating Deposition | Atomic Layer Deposition Systems

Atomic Layer Deposition Systems

Atomic Layer Deposition (ALD) is a coating technique based on Chemical Vapor Deposition (CVD). The main difference is that in ALD a binary reaction is split into two half-reactions in order to achieve a precise control over the film thickness. Atomic layer deposition provides a unique method for depositing ultrathin films on surfaces. This technique uses sequential surface reactions to coat substrates with high conformality and precise thickness control at the atomic scale.

Click here for more information

Request a Quote for Atomic Layer Deposition Systems
If you'd like us to help you source a Quotation for Atomic Layer Deposition Systems please click here. Once submitted, we will try and place you in contact with a suitable Atomic Layer Deposition Systems supplier within 48 hours.
Equipment
Oxford Instruments Launches OpAL Atomic Layer Deposition System
Oxford Instruments has introduced a new, compact open-load system that has been specifically designed for Atomic Layer Deposition (ALD).
BENEQ Thin Film System TFS 500 ALD
Thin Film System TFS 500 ALD reactor is designed for thin film processing, protective coating, functional surface buildup and doping purposes. Substrate alternatives include wafers and other planar substrates, powders and porous substrates and complex 3D substrates. TFS 500 can be equipped with a manual load lock for rapid wafer processing. Reactor operates in batch mode. Variable reaction chambers can be fitted to the reactor making it possible to optimize the reaction chamber design depending on the application.
NorthStar Atomic Layer Deposition (ALD) System from SVT Associates
SVT Associates' NorthStar™ Atomic Layer Deposition (ALD) system is a versatile research deposition tool for thermal or energy enhanced ALD.
PlasmaPro 100 Etch and Deposition Tool from Oxford Instruments
Oxford Instruments has launched the PlasmaPro 100 Etch and Deposition tool which is a highly configurable system.
Oxford Instruments Introduces PlasmaPro System133 Etch + Deposition Tool
Oxford Instruments has launched an advanced etch and deposition tool called PlasmaPro System133 which delivers excellent performance for both research and development and production.
Oxford Instruments Plasma Technology: FlexAL Atomic Layer Deposition Tool
Oxford Instruments’ FlexAL product family provides a new range of flexibility and capability in the engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition (ALD) processes and thermal ALD within a single system.
Site Sponsors
Site Sponsors
  • Dynamic-Ceramic: UK supplier of advanced ceramics - zirconia and alumina products