Equipment | Coating Deposition |Atomic Layer Deposition Systems

Atomic Layer Deposition Systems


Atomic Layer Deposition (ALD) is a coating technique based on Chemical Vapor Deposition (CVD). The main difference is that in ALD a binary reaction is split into two half-reactions in order to achieve a precise control over the film thickness. Atomic layer deposition provides a unique method for depositing ultrathin films on surfaces. This technique uses sequential surface reactions to coat substrates with high conformality and precise thickness control at the atomic scale.

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