Atomic Scale Accuracy Driving Quantum Breakthroughs

Oxford Instruments shares its market-leading scientific technology and expertise with academic and commercial organizations worldwide, working within key market segments such as semiconductors, materials analysis, and healthcare and life sciences.

Innovation continues to be the driving force behind Oxford Instruments’ success and growth, supporting the company’s core goal of accelerating breakthroughs that aim to result in a brighter, healthier, greener, and more productive future.

Work towards these breakthroughs is driving record levels of R&D investment in new materials and techniques designed to support decarbonization and productivity worldwide, creating a major growth opportunity for Oxford Instruments.

Oxford Instruments was founded in 1959 as the first technology business to be spun out from Oxford University. It currently maintains a unique position, acting as a catalyst that powers real world progress by anticipating global drivers and connecting academic researchers with commercial applications engineers.

Oxford Instruments is now a global company listed on the FTSE250 index of the London Stock Exchange (OXIG).

Plasma Technology

Oxford Instruments Plasma Technology designs, manufactures, and delivers ground-breaking plasma processing applications and solutions designed for use throughout the compound semiconductor industry.

Its core technological offerings include atomic layer etch (ALE), plasma-enhanced atomic layer deposition (PEALD), conventional plasma deposition and etch, and ion-beam deposition and etch.

The company’s product offering ranges from highly flexible and compact systems for research and development to clustered cassette-to-cassette platforms and batch tools suitable for high-throughput production processing.

Solutions and products developed by Oxford Instruments Plasma Technology improve device performance via material engineering and interface optimization, driving progress in some of the most advanced applications in high-growth markets such as power semiconductors, quantum, datacom, 3D sensing, and augmented reality.

Semi Interface Magazine

Oxford Instruments’ Semi Interface magazine highlights its commitment to this work, with its third issue focusing on how the company’s cutting-edge plasma etch, deposition, ALD, and ALE technologies support the development and advancement of quantum technologies.

Applications in this field are varied and unrecognizable compared to the company’s work in other markets, meaning that optimizing material interfaces for quantum applications represents a major technical challenge.

This issue is guest edited by two of Oxford Instruments’ quantum experts, Dr Harriet van der Vliet and Dr Nick Chittock.

Released during the International Year of Quantum Science and Technology, this issue looks into the quantum ecosystem and the developments in atomic scale processing that underpin this.

Global leaders in the quantum technology space offer their insight, with an introduction to the International Year of Quantum provided by the UK’s Sir Peter Knight, updates from Scotland’s University of Glasgow, and features from the USA by Professor Austin Minnich and Dr Russ Renzas on atomic layer etching.

Advances in India are also explored, with Professor Kasturi Saha outlining work with quantum sensing and the National Quantum Mission sensing, and Australia’s contribution to the field represented via an interview from Professor Stephen Bartlett, Director of the University of Sydney’s Nano Institute and Senior Advisor in Quantum Architectures with Diraq.

Technology developments from Oxford Instruments’ long-time collaborators, Eindhoven University of Technology (TU/e), are also shared.

Finally, the company celebrates its 20-year collaboration anniversary with details of its recently signed MoU, and a look at its brand new ISO5/6 cleanroom, which features one of the most advanced semiconductor metrology labs in Europe.

Image

This information has been sourced, reviewed and adapted from materials provided by Oxford Instruments Plasma Technology.

For more information on this source, please visit Oxford Instruments Plasma Technology.

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Oxford Instruments Plasma Technology. (2026, October 19). Atomic Scale Accuracy Driving Quantum Breakthroughs. AZoM. Retrieved on October 19, 2026 from https://www.azom.com/article.aspx?ArticleID=25099.

  • MLA

    Oxford Instruments Plasma Technology. "Atomic Scale Accuracy Driving Quantum Breakthroughs". AZoM. 19 October 2026. <https://www.azom.com/article.aspx?ArticleID=25099>.

  • Chicago

    Oxford Instruments Plasma Technology. "Atomic Scale Accuracy Driving Quantum Breakthroughs". AZoM. https://www.azom.com/article.aspx?ArticleID=25099. (accessed October 19, 2026).

  • Harvard

    Oxford Instruments Plasma Technology. 2026. Atomic Scale Accuracy Driving Quantum Breakthroughs. AZoM, viewed 19 October 2026, https://www.azom.com/article.aspx?ArticleID=25099.

Ask A Question

Do you have a question you'd like to ask regarding this article?

Leave your feedback
Your comment type
Submit

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.