The CP-8000+ from COXEM is a sophisticated sample preparation tool that helps etch a cross-section of a sample with the help of an argon ion beam. This process prevents structural damage and physical deformation and does not need chemical processes that are hard to perform.
Additionally, the system streamlines the cross-sectional analysis of the sample by processing large areas ranging from tens of um to several mm.
Application
Mechanical Polishing (Before). Image Credit: COXEM Co., Ltd.
Ion Beam Polishing (After). Image Credit: COXEM Co., Ltd.
Ar Ion Milling System. Image Credit: COXEM Co., Ltd.
Focused ion beam system. Image Credit: COXEM Co., Ltd.
Specifications
Source: COXEM Co., Ltd.
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| Gas Used |
Ar(Argon) gas |
| Milling Speed |
700 μm/h (Si at 8 kV) |
| Accelerating Voltage |
2~8 kV |
| Beam Diameter |
Approx. 500 μm |
| Working Pressure |
4.3 x 10-5 torr |
| Beam Alignment |
Precision beam alignment using Digital Microscope |
| Maximum Sample Size |
20 (W) x 10 (D) x 9 (H) mm |
| Sample Moving Range |
(Z: ±2 mm, Y: ±2 mm) |
| Stage Swing Rotation |
-35° ~ +35° |
| Stage for Flat Milling |
Tilt Range : 40° to 80°
Rotation Speed : 6 rpm/min
Sample Size : Ø30 x 11.4mm |
| Display |
Touch panel (1024 x 600 7 inch display) |
| Chamber Camera |
Magnification : x5, x10, x20, x40
4 step brightness control
Ion beam observation mode |
| Digital Camera for sample alignment |
Magnification : x5, x10, x20, x40
USB type |
| Evacuation System |
Turbo-molecular pump (66 L/s)
+ Diaphragm pump |
| Dimension |
610 (W) x 472 (D) x 415 (H) mm |