May 26 2009
Cabot Microelectronics Corporation (Nasdaq: CCMP), the world's leading supplier of chemical mechanical planarization (CMP) polishing slurries and growing CMP pad supplier to the semiconductor industry, announced today that it has received an Outstanding Supplier Award for the second consecutive year from Taiwan-based Inotera Memories, Inc. (Inotera) for supplying CMP polishing slurries. This award is granted to suppliers who demonstrate excellence across a variety of areas, including product quality, cost of ownership, on-time delivery, world-class service, and a commitment to technology and safety.
William Noglows, Chairman and CEO of Cabot Microelectronics commented, "It is an honor to receive this award, which we believe reflects our strong commitment to help Inotera maintain its zero defects principle. As part of our three key initiatives of Technology Leadership, Operations Excellence and Connecting with Customers, we aim to continue to supply consistent, high performing products and provide responsive technical support to meet and exceed the needs of our customers."
Charles Kau, President of Inotera Memories stated, "The success of Inotera cannot be achieved without close cooperation with our important partners; hence the annual outstanding supplier is awarded in return for great performance and contributions from Cabot Microelectronics in this past year".
Cabot Microelectronics Corporation, headquartered in Aurora, Illinois, is the world's leading supplier of CMP polishing slurries and growing CMP pad supplier to the semiconductor industry. The company's products play a critical role in the production of the most advanced semiconductor devices, enabling the manufacture of smaller, faster and more complex devices by its customers. Since becoming an independent public company in 2000, the company has grown to approximately 900 employees globally. The company's vision is to become the world leader in shaping, enabling and enhancing the performance of surfaces, so the company is leveraging its expertise in CMP slurry formulation, materials and polishing techniques developed for the semiconductor industry and applying it to demanding surface modification applications in other industries where shaping, enabling and enhancing the performance of surfaces is critical to success.