Liverpool University Order Second Atomic Layer Deposition Tool

Oxford Instruments Plasma Technology (OIPT), leading manufacturer of systems for etch, deposition and growth announces a second order from Liverpool University for its OpAL Open Load Atomic Layer Deposition tool. OIPT's compact OpAL system is a unique thermal ALD tool with a clear and easy upgrade route to plasma, allowing the combination of both plasma and thermal ALD in a single tool. The first system was purchased as part of an EPSRC funded research project*, and the second OpAL was purchased as part of a joint industry/government funding initiative. Liverpool University continues to strengthen its links with industry, and is achieving this through its collaboration with OIPT and SAFC Hitech.

Oxford Instruments' OpAL ALD System

"Our current OpAL system is being used to develop thermal ALD processes using ammonia and metal organic precursors for the deposition of hafnium-nitride and lanthanide nitrides / oxynitrides, these materials are of significant interest for gate stack applications in integrated circuits. The OpAL system is a solid research tool, which is well built and has a user friendly control system. As a research scientist with an interest in developing ALD processes, I especially like the fact that the OpAL shows plenty of scope for future expansions such as the plasma upgrade option and access ports for in-situ monitoring," comments Dr Richard Potter, University of Liverpool, Dept. of Engineering,

Prof. Paul Chalker, University of Liverpool, Dept. of Engineering adds, "This additional OpAL system expands our R&D opportunities with plasma. We chose the OpAL because of its flexibility and its well established suitability for research applications both here and at other universities running similar projects."

Chris Hodson, ALD Product Manager at OIPT said, "Oxford Instruments prides itself in its ongoing commitment to collaborative research, and is involved with a number of prestigious universities worldwide. Our OpAL systems offer the most advanced ALD capabilities in a research platform which is ideally suited to industry collaboration, and we are committed to providing top class equipment and support to Liverpool University on these projects."

*EP/E048560/1 - Atomic layer deposition of hafnium-nitride and lanthanide nitrides

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