Particle Size and Count Monitoring of CMP Slurries

Both the mean particle size and large particle counts (LPCs) in CMP slurries are critical parameters that affect slurry performance and health. The mean abrasive size affects the material removal rate (MRR), while the LPC value affects yield. The mean size can be measured both in the lab and online using dynamic light scattering (DLS). The LPC values are measured using single particle optical sizing (SPOS). This presentation will explain DLS and SPOS technology, lab and online solutions, analytical best practices, and data interpretation.

Join the free webinar with certification of attendance now.  

This webinar will cover a range of topics, including: 

• Theory of DLS and SPOS
• Mean size vs. LPC measurement options
• Lab and online testing best practices
• Data interpretation
• How Entegris provides optimal solutions

Ideal For:

• Semiconductor chemists using particle size analyzers
• Process engineers concerned with CMP slurry monitoring
• CMP delivery systems engineers

Meet the Webinar Speaker

Mark Bumiller, Technology Manager at Entegris, has worked in the field of particle size analysis for over forty years. He has served as a member of the expert committee for USP 788, the executive committee of the International Fine Particle Research Institute (IFPRI), and the executive committee of Particle Technology Forum of the American Institute of Chemical Engineers. Mark is an active member of Technical Committee 24 within ISO, helping to write standards for particle size and zeta potential analysis.