A variety of direct patterning or masking techniques that complement the overall nanofabrication process are provided by focused ion beam (FIB). To reduce the efforts involved in process development and simplify the nanofabrication process, milling, direct etching or deposition can be done. In addition to standard resist lithography, other techniques like ion implantation, surface functionalization, and resistless hard masking can be used for selectively modifying a material or directing a subsequent processing step.
FIB Nanofabrication Beyond Gallium
EBL-based nanofabrication is perfectly complemented by FIB nanofabrication methods, to the extent that FIB and EBL can be integrated in a system with reproducibility, high resolution, automation, and lithography class stability. Raith’s proprietary FIB technology can be upgraded for stable delivery of a variety of new ion species beyond gallium, including Si and Au. These ion species can be easily selected within seconds and used for new, improved processing. Moreover, this technology can be extended to ion sources that are custom-made for application-specific capabilities, for instance, ion implantation in quantum technology.
Multi Species Alloy Source. Image credit: Raith
Nanopatterning and Imaging with Helium and Neon
Focused helium and neon beams pave the way for nanopatterning with their complementary strengths. Delivered from a gas field ion source, these ions are very light and provide different material/beam interactions with lower milling rate but higher lateral machining acuteness. The patterning of ultra-fine features is enabled by the ZEISS ORION Nanofab along with Raith ELPHY MultiBeam based on a microscope platform. Nanofabrication can be further improved by using helium and neon ion beams related to mix-and-match methods that utilize EBL or FIB Nanofabrication instruments.
This information has been sourced, reviewed and adapted from materials provided by Raith.
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