FIB-SEM Nanofabrication: Key Strengths for Benchmark Applications

FIB or Focused Ion Beam technology has come into its own in the last couple of decades. In combination with Scanning Electron Microscopy or SEM, the FIB technique becomes more versatile and able to handle many different functions.

The FIB-SEM process of microscopy and lab analysis is commonly used. It becomes even more valuable as the FIB-SEM microscope system can handle tasks of basic patterning and sample preparation. The FIB-SEM system designed by Raith has become a nanofabrication and 3D patterning tool that also manages to handle top-down lithography. Researchers can use the FIB-SEM designed around the FIB as the primary patterning technique to take advantage of the unique capabilities afforded by focused ions, use the microscopy techniques as well as laser interferometer stage capabilities. This makes the Raith system unique and formidable when compared to other options available.

Strengths and Limitations of EBL

Electron Beam Lithography or EBL is a popular technique for a dedicated nanofabrication system in the industry. The system uses a focused beam of electrons on an electron sensitive film to create the nanostructures. It offers accurate results with best positional and beam current stability. It is effortless to use and industry standard GDSII designs software, advanced beam control, navigation, and true automation allow the creation of nanostructures quickly and accurately on flat surfaces. However, EBL is not able to work as well on topographic surfaces for patterning. The definition of three dimensional shapes becomes complicated to handle.

Number of steps for e.g. lift-off process is strongly reduced in case of FIB (right) compared to EBL approach (left).

Figure 1. Number of steps for e.g. lift-off process is strongly reduced in case of FIB (right) compared to EBL approach (left). Image credit: Raith

To Download the Whole White paper Click Here

 

Raith.

This information has been sourced, reviewed and adapted from materials provided by Raith.

For more information on this source, please visit Raith.

Citations

Please use one of the following formats to cite this article in your essay, paper or report:

  • APA

    Raith. (2023, June 09). FIB-SEM Nanofabrication: Key Strengths for Benchmark Applications. AZoM. Retrieved on April 20, 2024 from https://www.azom.com/article.aspx?ArticleID=15588.

  • MLA

    Raith. "FIB-SEM Nanofabrication: Key Strengths for Benchmark Applications". AZoM. 20 April 2024. <https://www.azom.com/article.aspx?ArticleID=15588>.

  • Chicago

    Raith. "FIB-SEM Nanofabrication: Key Strengths for Benchmark Applications". AZoM. https://www.azom.com/article.aspx?ArticleID=15588. (accessed April 20, 2024).

  • Harvard

    Raith. 2023. FIB-SEM Nanofabrication: Key Strengths for Benchmark Applications. AZoM, viewed 20 April 2024, https://www.azom.com/article.aspx?ArticleID=15588.

Ask A Question

Do you have a question you'd like to ask regarding this article?

Leave your feedback
Your comment type
Submit

While we only use edited and approved content for Azthena answers, it may on occasions provide incorrect responses. Please confirm any data provided with the related suppliers or authors. We do not provide medical advice, if you search for medical information you must always consult a medical professional before acting on any information provided.

Your questions, but not your email details will be shared with OpenAI and retained for 30 days in accordance with their privacy principles.

Please do not ask questions that use sensitive or confidential information.

Read the full Terms & Conditions.