One of the sputtering system models offered by Semicore is the SC943 In-line Sputtering system. It is a quick cycle load lock sputtering system that comes with an optional substrate heat.
It has a dynamic pressure control and uses up to four high utilization linear magnetron sputtering sources.
The sputtering technique includes DC, pulse DC, RF and MF AC. It is controlled by PC/PLC and is simple to operate data logging, on-line support, HMI, and tolerance checking.
It uses RF etch pre-clean and makes use of either cryogenic or turbo high vacuum pumps.
Semicore Equipment Inc. provided a very capable system that was delivered on schedule and within budget. Their personnel were prompt, courteous and got the job done. When the need for equipment arises in the future, I will certainly contact Semicore.
Bill Goward, Sr. Equipment Manager, Stion Corporation