IMPEL

Impel PVD systems from Semicore are multi-chamber decomposition systems, which use a cost-effective modular design to facilitate effortless configuration to match a range of thin film decomposition applications, mainly for research and development or small batch production.

Up to three process chambers each of which are individually configured for a particular application, share a central load lock for handling several substrate shapes and sizes up to 200 mm.

The system features integrated computer control along with instruction based operation, data logging and tolerance checking.

A complete list of standard alternatives is available to configure the Impel PVD system in order to match the user’s specific needs. Ballroom or bulkhead installation is also offered.

Impel PVD Deposition Techniques

The Impel PVD deposition techniques are as follows:

  • Electron beam evaporation
  • Glancing angle deposition (GLAD)
  • Pulsed laser deposition (PLD)
  • Magnetron sputtering: DC, pulsed-DC or RF
  • Cathodic arc plasma deposition
  • Organic evaporation: for organic electronics and PLED/OLED

Key Features and Options

The main features and options of the Impel PVD systems are as follows:

  • Pumping: cryogenic or turbomolecular
  • Vacuum chamber: up to three independent process chambers, which is of 16 or 24” in diameter, made of stainless steel scaled to suit the particular application. Rear chamber access door for providing service and maintenance
  • Aluminum door with viewport (standard)
  • Substrate holders: rotating substrate holder can be cooled, heated or biased
  • Load lock: automatic or manual transfer, different substrate shapes and sizes up to 200 mm, high vacuum pumping
  • Gas and pressure control: dynamic pressure control, single or multi MFC gas channels
  • Monitoring: optical monitoring, crystal monitoring and special data gathering software for in-situ measurement of film deposition
  • Ion source: IBAD-assisted deposition, pre-cleaning, milling

Customer Testimonial

Semicore Equipment, Inc., was a partner in developing a custom deposition tool integrating magnetron sputtering and filtered cathodic arc deposition. The company's task to design and build the vacuum system, integrate all components and provide a unified graphical user interface was done swiftly, professionally, and to spec.  The engineering staff was knowledgeable about the technology and applicable codes; it was an excellent example of team work where all partners listen to the ideas of others.  The product was a well built, safe, and easy to use piece of equipment.  I look forward to do more business with this company.

Andre Anders, PhD, Senior Scientist, Lawrence Berkeley National Laboratory

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