Semiconductor/Wafer Metrology Tools

With electronics getting smaller and smaller the demands on semiconductor manufacturers are increasing. To ensure the quality and consistency of substrates, wafer manufacturers employ metrology tools to control the quaility of their materials. Metrology tools for the semiconductor industry may include a variety of technologies and instruments such as wafer probes, AFMs, SEMs, profilometers and ellipsometers.
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Equipment
The Phemos-200 developed by Hamamatsu is an emission microscope which consists of a high-resolution, cooled CCD camera with a pixel of about 1024×1024.
CAMECA's new generation Shallow Probe: the metrology solution for advanced integration of new processes.
The TriPhemos Time-Resolved Imaging Emission Microscope is suitable for analyzing the circuit timing by detecting the faint light which is generated when CMOS transistors operate using a two-dimensional infrared detector, thus analyzing the device timing with picosecond precision.
The new FRT MHU Automated Wafer Metrology and Measurement Tool is a multi-cassette wafer metrology tool for the fully automated inspection of wafers. The tool accepts wafers from 2” up to 8” in diameter and has been designed from ground-up to accommodate the latest metrology workflow and standard requirements in the wafer fab. All components harmonize perfectly to assure superior uptime, throughput and precision.
Hamamatsu offers the iPhemos-SD Inverted Emission Microscope which is suitable for docking with different types of testers.
Manual, non-contact measurement of wafer thickness, TTV and bow. Portable and easy to set-up, the Proforma 300/G measures all wafer materials including Silicon, Gallium-Arsenide, Indium-Phosphide and wafers mounted to sapphire or tape.
Hamamatsu offers the IR-OBIRCH Analysis System which is a semiconductor failure analyzer.
This sophisticated, flexible wafer metrology system combines a MicroEpsilon profilometer with a high-performance, high-resolution vision system and laser interferometers to detect and measure laser-cut features on one side of a wafer relative to features on the other side of the wafer.
The FRT MicroProf® TTV is a metrology tool for surface and thickness measurements of wafers or similar products. Parts up to 300 mm diameter are measured with a resolution of 10 nm for the thickness measurement. Surface roughness and 3D structures can be measured on both specimen sides simultaneously.
THEMOS mini is a thermal emission microscope which is designed by Hamamatsu. It is suitable for indicating the occurrence of failures in the semiconductor device by displaying the detected thermal image superimposed onto the pattern image.
Semi-automated wafer characterization system for determining wafer thickness, TTV, bow warp, site and global flatness measurement. The Proforma 300SA can be used for all wafer materials and accommodates 200mm and 300mm wafer diameters.
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