Global data traffic is on the constant rise, which places pressure on the optical communication network as demand is driven towards transceivers with more and more bandwidth.
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InP-based photonic integrated circuits are well-established in this market, and it is anticipated that manufacturing capability will scale up to support the necessary network infrastructure transformation.
The main applications of InP-based components include lasers for silicon photonics, transceivers in data centers, access networks, mobile backhaul and metro markets.
The properties of InP and related compound semiconductor materials mean they are sought after for the production of optoelectronic devices that can perform at high frequencies.
Additionally, their natural wavelength mode of function of 1300 – 1650 nm matches well with the optimal spectral range of optical fibers employed in fiber optic communications.
Oxford Instruments Plasma Technology has designed state-of-the-art InP plasma processing solutions to offer cost-effective, high-performance and high-yield processing strategies to facilitate the scaling up of manufacturing capability.
This article highlights some key plasma processing steps to produce lasers and photodiodes and reveals the processing capabilities that Oxford Instruments can offer.
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This information has been sourced, reviewed and adapted from materials provided by Oxford Instruments Plasma Technology.
For more information on this source, please visit Oxford Instruments Plasma Technology.