Posted in | Materials Analysis

Oxford Instruments Plasma Technology Systems To Be Used By IFW Dresden

The Leibniz Institute for Solid State and Materials Research Dresden, Institute for Integrative Nanosciences (IFW Dresden-IIN), Germany will shortly install multiple Oxford Instruments Plasma Technology Systems for research into ‘lab on a chip’ integration.

An Oxford Instruments FlexAL atomic layer deposition system will be used for low temperature conformal coatings of high aspect ratio multifunctional smart tubes. Two PlasmaPro100 systems with ICP 180 are being installed for the manufacture of multifunctional membranes, microfluidics and micro/nano photonic structures.

As a leader in plasma etch and deposition equipment and processes, Oxford Instruments can offer a full suite of systems to its customers, allowing the versatility to combine several plasma technologies. This purchase will enable IFW Dresden-IIN to further its innovative research.

Dr. Stefan Harazim, head of the cleanroom at the IFW Dresden-IIN said, “Our research activities at the IFW Dresden-IIN cover a wealth of modern topics in the Nanosciences ranging from flexible magnetoelectronics and wavelength-tuneable quantum light sources over ultra-sensitive lab-in-a-tube systems to compact on-chip energy storage devices and autonomous micro-/nanorobotic systems. As such we require the very best research equipment, and chose Oxford Instruments systems for their excellent capabilities, versatility and customer support.”

“The proven versatility of the Oxford Instruments FlexAL and PlasmaPro System100 tools made them the ‘systems of choice’ for IFW Dresden-IIN’s integration work”, says Michelle Bourke, Business Group Director, Oxford Instruments Plasma Technology. “Our cutting-edge equipment provides a sound basis for applied academic research, with the capability to scale to production. We pride ourselves on being involved in providing process solutions for the micro- and nanometre engineering of materials for many pioneering applications.”

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