May 9, 2016 (Santa Barbara, CA) Oxford Instruments Asylum Research in conjunction with Materials Today presents the webinar “More Than Just Roughness: AFM Techniques for Thin Film Analysis” on June 1, 2016 at 11:00 am EDT.
This informative webinar explores the powerful capabilities of today’s atomic force microscopes (AFMs) for characterizing thin films and reviews recent improvements in speed, sensitivity, and ease of use. Discussions include new and improved capabilities for characterizing the electrical, mechanical, and functional response of thin films with examples highlighting a wide range of real-world applications, including their application to memory access devices in the semiconductor industry. Distinguished presenters are Dr. Donna Hurley, founder of Lark Scientific and former NIST project leader, and Dr. Kumar Virwani, Staff Member at IBM Research, Almaden, CA.
AFM has been used extensively for imaging and analysis at the nanoscale and has played an integral part in advancing thin films and coatings research,” “What is so exciting are the numerous measurements beyond basic 3D topography and roughness that are available today, such as quantitative modes for measuring nanoelectrical properties and nanomechanical properties (storage modulus and loss tangent). With state-of-the art instrumentation such as the Asylum Research Cypher AFM, high resolution and fast scanning make it easy to capture dynamic processes for a wide range of materials. This insightful webinar is an excellent resource for scientists in both academia and industry who want to learn more about the latest AFM techniques for thin film characterization.
Jason Li, Applications Manager, Asylum Research.
Registration for the webinar can be found at: http://www.materialstoday.com/characterization/webinars/afm-techniques-for-thin-film-analysis/