Oxford Instruments

Oxford Instruments

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Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology. We provide high technology tools and systems for industrial and research markets, based on our ability to analyse and manipulate matter at the smallest scale.

As mankind faces the many challenges of the 21st Century, Oxford Instruments is providing scientists the world over with the tools to tackle issues like alternative energy, climate change, environmental pollution and healthcare.

Business Groups include:

  • Austin Scientific
  • Industrial Analysis
  • Magnetic Resonance
  • NanoAnalysis
  • Nanoscience
  • Plasma Technology
  • Superconducting Technology

Primary Activity

High Technology Tools and Systems

Using Benchtop NMR to Determine Grease Content in Water Quality Monitoring

Using Benchtop NMR to Determine Grease Content in Water Quality Monitoring
Indium Phosphide (InP) Laser Diode Device Production: Maximising Performance with Plasma Deposition

Indium Phosphide (InP) Laser Diode Device Production: Maximising Performance with Plasma Deposition
Indium Phosphide (InP) Laser Diode Device Production: Defining the Mesa

Indium Phosphide (InP) Laser Diode Device Production: Defining the Mesa
How to Achieve High Yield Manufacturing of Mesas in GaAs Based VCSEL

How to Achieve High Yield Manufacturing of Mesas in GaAs Based VCSEL
Characterization of the c-Si/Al2O3 Interface with the Nonlinear Optical Technique of SHG Spectroscopy at Temperatures between 4 K up to 300 K

Characterization of the c-Si/Al2O3 Interface with the Nonlinear Optical Technique of SHG Spectroscopy at Temperatures between 4 K up to 300 K
Make Overburden Studies Routine

Make Overburden Studies Routine
Measuring Plasticizer Content in PVC

Measuring Plasticizer Content in PVC
Characterizing Complex Rock Samples with EBSD

Characterizing Complex Rock Samples with EBSD
Rapid Characterization of Deformed Quartz Rocks

Rapid Characterization of Deformed Quartz Rocks
Symmetry®: High Angular Resolution at High Speeds

Symmetry®: High Angular Resolution at High Speeds
Comprehensive EBSD Study of a Bivalve Shell

Comprehensive EBSD Study of a Bivalve Shell
Fast and Effective EBSD Mapping of Martensitic Stainless Steel

Fast and Effective EBSD Mapping of Martensitic Stainless Steel
Characterizing Microstructures in Steel and Ni at High Speeds

Characterizing Microstructures in Steel and Ni at High Speeds
Optimizing Atomic Layer Etch (ALE) Processes Using Optical Emission Monitoring

Optimizing Atomic Layer Etch (ALE) Processes Using Optical Emission Monitoring
PEALD of TiN using the Metal Organic Precursor TDMAT for Lower Resistivity Compared Equivalent Process Conditions

PEALD of TiN using the Metal Organic Precursor TDMAT for Lower Resistivity Compared Equivalent Process Conditions
The Rise of 2-Dimensional Materials

The Rise of 2-Dimensional Materials
Galvanic Anodes for Cathodic Protection: Analysis with the FOUNDRY-MASTER Xpert

Galvanic Anodes for Cathodic Protection: Analysis with the FOUNDRY-MASTER Xpert
Using Plasma Etching to Micromachine Silicon Structure on Thin Membranes

Using Plasma Etching to Micromachine Silicon Structure on Thin Membranes
Manufacturing of X-Ray Lenses with the Application of Bosch™ Deep Silicon Etch

Manufacturing of X-Ray Lenses with the Application of Bosch™ Deep Silicon Etch
Generating Orientation Maps to Present EBSD Data

Generating Orientation Maps to Present EBSD Data
Acquiring Data Using EBSD

Acquiring Data Using EBSD
Developments in EBSD

Developments in EBSD
An Introduction to EBSD

An Introduction to EBSD
Particle Analysis in Geology, Pollution and Wear Analysis with Energy Dispersive Spectroscopy

Particle Analysis in Geology, Pollution and Wear Analysis with Energy Dispersive Spectroscopy
Atomic Layer Deposition (ALD) for Controlled Deposition of Dielectric Materials in Complex Device Structures

Atomic Layer Deposition (ALD) for Controlled Deposition of Dielectric Materials in Complex Device Structures
CVD for the Synthesis and Production of Graphene and Other 2D Materials

CVD for the Synthesis and Production of Graphene and Other 2D Materials
A Fast Micro and Nano-Structuring Method with a High Dimensional Stability Using Ga+ Resistless Lithography (GaRL) for Improved Device

A Fast Micro and Nano-Structuring Method with a High Dimensional Stability Using Ga+ Resistless Lithography (GaRL) for Improved Device
Advancements in Inductively Coupled Plasma Chemical Vapour Deposition (ICPCVD) with a Focus on Temperature-Sensitive Devices

Advancements in Inductively Coupled Plasma Chemical Vapour Deposition (ICPCVD) with a Focus on Temperature-Sensitive Devices
Large Area EDS Mapping: Phase Distribution in Archaeological Samples

Large Area EDS Mapping: Phase Distribution in Archaeological Samples
Characterizing Aluminium Alloy and Its Inter-Metallic Phases Using EDS (Energy-Dispersive X-Ray Spectroscopy)

Characterizing Aluminium Alloy and Its Inter-Metallic Phases Using EDS (Energy-Dispersive X-Ray Spectroscopy)
EBSD Characterization of Industrial Materials after Ion Milling

EBSD Characterization of Industrial Materials after Ion Milling
Mineral Liberation Analysis in Conventional SEM with INCAMineral

Mineral Liberation Analysis in Conventional SEM with INCAMineral
Phase Characterization of Igneous Rock Using AutoPhaseMap Module of AZtecEnergy

Phase Characterization of Igneous Rock Using AutoPhaseMap Module of AZtecEnergy
EBSD Analysis of Grain Structure Changes During Isothermal Heating of an Aluminum Alloy

EBSD Analysis of Grain Structure Changes During Isothermal Heating of an Aluminum Alloy
Determining Distribution of Creep Damage in Materials Using EBSD Characterization

Determining Distribution of Creep Damage in Materials Using EBSD Characterization
EBSD Characterization of Hydrides in Zirconium Alloys for Nuclear Applications

EBSD Characterization of Hydrides in Zirconium Alloys for Nuclear Applications
Forescattered Image Acquisition with EBSD Detection for Grain Structure Analysis

Forescattered Image Acquisition with EBSD Detection for Grain Structure Analysis
Finding a Viable Processing Method for Graphene and Other 2D Materials

Finding a Viable Processing Method for Graphene and Other 2D Materials
Controlling Beam Shape and Collimation for Contamination Reduction in Ion Beam Sputter Deposition

Controlling Beam Shape and Collimation for Contamination Reduction in Ion Beam Sputter Deposition
Using Plasma Etching on the Nanoscale

Using Plasma Etching on the Nanoscale
Advancing Process Capabilities of Magnetron Sputter Tools

Advancing Process Capabilities of Magnetron Sputter Tools
Studying Mixtures of the Novel Gases and Photoresist Masked Silicon-based Dielectric Etching

Studying Mixtures of the Novel Gases and Photoresist Masked Silicon-based Dielectric Etching
Deep Silicon Etch Applications in MEMS and NEMS

Deep Silicon Etch Applications in MEMS and NEMS
Coating High-Power Semiconductor Lasers (Laser Diode Bars) Facets Via Ion Beam Deposition

Coating High-Power Semiconductor Lasers (Laser Diode Bars) Facets Via Ion Beam Deposition
Computer Modeling of an ICP Machine Design

Computer Modeling of an ICP Machine Design
Formation of Silicon Nanoparticles via Post Deposition Annealing for Thin-Film Solar Cells

Formation of Silicon Nanoparticles via Post Deposition Annealing for Thin-Film Solar Cells
Processing Multiple Compound Semiconductor Wafers Using ICP

Processing Multiple Compound Semiconductor Wafers Using ICP
Ion Beam Etching

Ion Beam Etching
Nanoscale Etching in Inductively Coupled Plasmas

Nanoscale Etching in Inductively Coupled Plasmas
Determination of Xylene Soluble in Polypropylene Using NMR

Determination of Xylene Soluble in Polypropylene Using NMR
Determination of Oil Content of Wax Using NMR

Determination of Oil Content of Wax Using NMR
Determination of Mineral Oil Content in Crystal Polystyrene Using NMR

Determination of Mineral Oil Content in Crystal Polystyrene Using NMR
Deposition of High Quality Films by the Inductively Coupled Plasma CVD Process

Deposition of High Quality Films by the Inductively Coupled Plasma CVD Process
Comparison of the Bosch and Cryogenically Cooled Deep Silicon Etch Processes

Comparison of the Bosch and Cryogenically Cooled Deep Silicon Etch Processes
Ion Beam Deposition – Applications and Advantages

Ion Beam Deposition – Applications and Advantages
The Importance of Maintaining Research and Development Tools

The Importance of Maintaining Research and Development Tools
Production of High Efficiency Solar Cells Using ICPCVD and PECVD

Production of High Efficiency Solar Cells Using ICPCVD and PECVD
High Brightness LEDs – Large Batch Tool for GaN Etching of HBLEDs

High Brightness LEDs – Large Batch Tool for GaN Etching of HBLEDs
NMR - Nuclear Magnetic Resonance in Core Analysis

NMR - Nuclear Magnetic Resonance in Core Analysis
Capillary Pressure Measurement in the Oil Exploration Industry Using NMR

Capillary Pressure Measurement in the Oil Exploration Industry Using NMR
NMR Core Analysis in the Oil Exploration Industry

NMR Core Analysis in the Oil Exploration Industry
Determination of Hydrogen Content in Fuels Using a Benchtop NMR by Oxford Instruments Magnetic Resonance

Determination of Hydrogen Content in Fuels Using a Benchtop NMR by Oxford Instruments Magnetic Resonance
Determination of Fat Content in Foods Using a Benchtop NMR by Oxford Instruments Magnetic Resonance

Determination of Fat Content in Foods Using a Benchtop NMR by Oxford Instruments Magnetic Resonance
Determination of Polybutadiene Rubber Content in Impact Polystyrene Using a Benchtop NMR by Oxford Instruments Magnetic Resonance

Determination of Polybutadiene Rubber Content in Impact Polystyrene Using a Benchtop NMR by Oxford Instruments Magnetic Resonance
Determination of Wax Content in Oils Using a Benchtop NMR by Oxford Instruments Magnetic Resonance

Determination of Wax Content in Oils Using a Benchtop NMR by Oxford Instruments Magnetic Resonance

More Articles

Oxford Instruments announces Dr Philip Moll as the winner of the 2018 Nicholas Kurti Science Prize for Europe

Oxford Instruments announces Dr Philip Moll as the winner of the 2018 Nicholas Kurti Science Prize for Europe
High Volume Semiconductor Device Manufacturers choose Oxford Instruments Plasma Technology for “Lab to Fab” Solutions

High Volume Semiconductor Device Manufacturers choose Oxford Instruments Plasma Technology for “Lab to Fab” Solutions
New era in high field superconducting magnets – opening new frontiers in science, nanotechnology and materials discovery

New era in high field superconducting magnets – opening new frontiers in science, nanotechnology and materials discovery

Oxford Instruments Now Offers Paramount Process Facilities in Asia

Oxford Instruments Now Offers Paramount Process Facilities in Asia

Announcing the Successful Industrial Feasibility Test of a Turnkey Quantum Hall System for Graphene Characterisation and Primary Resistance Metrology

Announcing the Successful Industrial Feasibility Test of a Turnkey Quantum Hall System for Graphene Characterisation and Primary Resistance Metrology
Oxford Instruments Industrial Analysis Business Becomes Hitachi High-Tech Analytical Science

Oxford Instruments Industrial Analysis Business Becomes Hitachi High-Tech Analytical Science
Oxford Instruments Launches the MQC+ Benchtop NMR Analyser for Easier, Faster, More Accurate Quality Assurance

Oxford Instruments Launches the MQC+ Benchtop NMR Analyser for Easier, Faster, More Accurate Quality Assurance
FREE 'Atomic Scale Processing' Workshop on Tuesday 4th April at MINATEC-LETI, Grenoble, France

FREE 'Atomic Scale Processing' Workshop on Tuesday 4th April at MINATEC-LETI, Grenoble, France

More News

Archived Oxford Instruments News

Oxford Instruments - Company Presentation

Oxford Instruments - Company Presentation
Capabilities Overview of Oxford Instruments

Capabilities Overview of Oxford Instruments
Overview of Oxford Instruments Strategy

Overview of Oxford Instruments Strategy

Oxford Instruments Corporate Video

Oxford Instruments Corporate Video
Periodic Table app for Plasma Etch & Deposition processes from Oxford Instruments

Periodic Table app for Plasma Etch & Deposition processes from Oxford Instruments
Semiconductor Device Fabrication from Oxford Instruments

Semiconductor Device Fabrication from Oxford Instruments
Pulsar - Benchtop NMR Spectrometer

Pulsar - Benchtop NMR Spectrometer
GeoSpec2+ Industry Standard NMR Core Analyzer

GeoSpec2+ Industry Standard NMR Core Analyzer
GeoSpec 12 MHz Core NMR Analyzer

GeoSpec 12 MHz Core NMR Analyzer
MQR TD-NMR Research System

MQR TD-NMR Research System
MQC+ Benchtop NMR Analyzer

MQC+ Benchtop NMR Analyzer
The OptistatDry TLEX: Versatile Cryofree® Top Loading Cryostat Designed for Different Spectroscopy Experiments

The OptistatDry TLEX: Versatile Cryofree® Top Loading Cryostat Designed for Different Spectroscopy Experiments
OptistatDry: Temperature Controlled Sample-in-Vacuum Measurement Environments for Spectroscopy

OptistatDry: Temperature Controlled Sample-in-Vacuum Measurement Environments for Spectroscopy
Optical Cryostats from Oxford Instruments

Optical Cryostats from Oxford Instruments
High Performance CVD system: Nanofab

High Performance CVD system: Nanofab
Compact Open Load ICPCVD System: PlasmaPro 80 ICPCVD

Compact Open Load ICPCVD System: PlasmaPro 80 ICPCVD
Compact Open Load PECVD System: PlasmaPro 80 PECVD

Compact Open Load PECVD System: PlasmaPro 80 PECVD
Compact Open Load ICP Etch System: PlasmaPro 80 ICP

Compact Open Load ICP Etch System: PlasmaPro 80 ICP
Large Batch Open Load PECVD System: PlasmaPro 800 PECVD

Large Batch Open Load PECVD System: PlasmaPro 800 PECVD
Load Locked or Cassette PECVD System: PlasmaPro 100 PECVD

Load Locked or Cassette PECVD System: PlasmaPro 100 PECVD
Load Locked or Cassette ICPVD System: PlasmaPro 100 ICPCVD

Load Locked or Cassette ICPVD System: PlasmaPro 100 ICPCVD
Load Locked or Cassette ICP Etch System: PlasmaPro 100 Cobra

Load Locked or Cassette ICP Etch System: PlasmaPro 100 Cobra
Load Locked or Cassette RIE System: PlasmaPro 100 RIE

Load Locked or Cassette RIE System: PlasmaPro 100 RIE
Large Batch PECVD System: PlasmaPro 1000 Stratum

Large Batch PECVD System: PlasmaPro 1000 Stratum
Plasma & Thermal ALD System: FlexAL

Plasma & Thermal ALD System: FlexAL
Load Locked or Cassette ICP Single Wafer Etch System: PlasmaPro 100 Polaris

Load Locked or Cassette ICP Single Wafer Etch System: PlasmaPro 100 Polaris
Load Locked or Cassette Deep Silicon Etch System: PlasmaPro 100 Estrelas

Load Locked or Cassette Deep Silicon Etch System: PlasmaPro 100 Estrelas
Open Load ALD system: OpAL

Open Load ALD system: OpAL
Large Batch Open Load RIE System: PlasmaPro 800 RIE

Large Batch Open Load RIE System: PlasmaPro 800 RIE
Compact Open Load RIE System: PlasmaPro 80 ICPCVD

Compact Open Load RIE System: PlasmaPro 80 ICPCVD
Ion Beam Etch System: IonFab 300 IBE

Ion Beam Etch System: IonFab 300 IBE