Rohm and Haas Electronic Materials will invest $60 million in leading edge lithography equipment to support its extensive research and development of advanced 193 nanometer (nm) photoresist and anti-reflective coatings u...
The results of COST Action 532 were reported on at the International Tribology Conference ECOTRIEB 2007 held in Ljubljana, Slovenia, from 12 to 15 June 2007. The COST Action contributed jointly with the EUREKA ENIWEP (Eu...
Argonne reached another milestone in the design and construction of the Linac Coherent Light Source (LCLS) undulator system.
LCLS will be the world's first X-ray free electron laser to produce hard X-rays when it...
FEI has released its new Phenom™ microscope, an innovative system that bridges the critical price and performance gap between optical and scanning electron microscope (SEM) technologies. Operated easily via its h...
To evaluate the effectiveness, flexibility and practicality of the Nano Risk Framework, announced on June 21 with Environmental Defense, DuPont conducted demonstration projects on three different classes of nanoscale mat...
Advanced Film Solutions, Tampa Bay's fastest growing window film provider has agreed to partner with Huper Optik Window Films.
Mike Feldman, President of Advanced Film Solutions describes the relationship as, &quo...
BASF announced that it has entered into an agreement with IBM to jointly develop electronic materials required in the production process of the most advanced integrated circuits (ICs). Under the agreement, BASF and IBM w...
LANXESS is backing innovation and is ramping up investment in research and development following a successful round of restructuring and consolidation. “At approximately EUR 100 million, our R&D budget for 2007...
They may come from very different sectors, but executives attending the Novelis Europe Innovation Days event on June 12 and 13 had one thing in common: the desire to see first-hand how the world's largest aluminium r...
Ferro Corporation's Electronic Material Systems business has further advanced its breakthrough chemical mechanical planarization (CMP) technology with two slurries that enable high-yield processing of 65 nanometer an...
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