Research and Markets has announced the addition of the "Global Chemical Vapor Deposition Market 2014-2018" report to their offering.
The analysts forecast the Global Chemical Vapor Deposition market to grow at a CAGR of 11.43 percent over the period 2013-2018. One of the key factors contributing to this market growth is the increasing demand for CVD in the Semiconductor industry. The Global Chemical Vapor Deposition market has also been witnessing the increasing use of plasma-enhanced CVD. However, the high total cost of ownership could pose a challenge to the growth of this market.
Key vendors dominating this space are Adeka Corp., Applied Materials Inc., ASM International N.V., and Kurt J. Lesker Co.
Other vendors mentioned in the report are AIXTRON SE, Beneq Oy., Levitech BV, Oxford Instruments plc, Picosun Oy, SENTECH Instruments GmbH, SoLayTec, SVT Associates Inc., Ultratech Inc., Veeco Instruments Inc., Hitachi Kokusai Electric Inc., NCD Co. Ltd., Encapsulix SAS, Centrotherm Photovoltaics AG, and Tokyo Electron Ltd.
Commenting on the report, an analyst from the team said: Plasma-enhanced CVD is carried out in a vacuum system to generate plasma. The process is the only CVD technique to ensure deposition of a thin film coating at a low temperature. For instance, deposition of Si3N4 on integrated circuits needs to be carried out at a low temperature through plasma enhanced CVD. Thus, there has been an increased use of plasma-enhanced CVD in the market in 2013, although it is a more expensive technique than thermally activated CVD. This trend is expected to contribute significantly to the growth of the Global Chemical Vapor Deposition market during the forecast period.
According to the report, increasing demand for CVD among semiconductor manufacturers is one of the major drivers in the market, as CVD equipment and materials are used widely in the manufacturing of semiconductors.
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