Nanonex Corporation, the inventor and world's leading provider in nanoimprint lithography solutions with the longest history, announces the delivery of a Nanonex NX-2500 to Centre National de la Recherche Scientifique (CNRS), France.
The NX-2500 imprintor was purchased by BTR program of CNRS to support Basic Technology Research Network in the field of Micro-Nanotechnologies and Nanosciences.
The Nanonex NX-2500 is a full wafer nanoimprinter and photolithography aligner. It is capable of all imprint forms: thermal, photo-curable, and embossing with sub-5nm imprinting resolution and sub-1 micrometer alignment accuracy. Based on the Nanonex unique patented Air Cushion PressTM technology, the NX-2500 offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, which significantly increases mask lifetime.
The NX-2500 will be used as a tool for nanomanufacturing and nano/micro fabrication at the Technology Platform of LAAS in the cutting edge research of nanobiosystem, photonics, ultimate electronics, etc. Nanonex is proud to support the leading edge research at LAAS-CNRS in Toulouse.