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Veeco PVD and CVD Technology Selected by Leading Hard Disk Manufacturers

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Veeco Instruments Inc. (Nasdaq: VECO) announced today it has been selected by leading global hard disk drive manufacturers for critical technology that enables higher areal density for next generation thin film magnetic heads.

"Recent orders for our NEXUS(R) TAMR Physical Vapor Deposition (PVD) System and the NEXUS Chemical Vapor Deposition (CVD) System, combined with proven eight inch wafer capabilities, demonstrate Veeco's continued technology leadership position as a partner that enables disk drive manufacturers to increase storage capacity," commented Robert P. Oates, Executive Vice President, Data Storage. "We are also working closely on other active technology programs, such as diamond-like carbon deposition for head overcoat and hard bias solutions. Technologies like these are critical to increasing areal density to 1 Tb/in2 and beyond."

The NEXUS TAMR (Thermal Assisted Magnetic Recording) System leverages Veeco's production-proven high rate reactive alumina platform and proprietary process control. The NEXUS CVD system enables ruthenium deposition for advanced perpendicular magnetic recording (PMR) for areal densities >500Gb/in2.

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