Researchers Use Picosun’s Plasma-Enhanced ALD System for Graphene Growth

Researchers from Xi’an Jiaotong University, have demonstrated graphene deposition at a low temperature of 400°C, which was made possible using the PICOPLASMA™ remote plasma source system from Picosun Oy, a renowned atomic layer deposition (ALD) system manufacturer.

The research was headed by Prof. Zuo-Guang Ye and Prof. Wei Ren at Xi’an Jiaotong University and not only expands upon the wide range of applications for graphene but also the applications for ALD.

The use of ALD in graphene manufacture, which is a recognized and extensively used technique in the semiconductor industry enables graphene to make a breakthrough in modern micro and nanoelectronics manufacturing processes.

The Managing Director of Picosun, Juhana Kostamo stated that breakthrough required advanced, sophisticated technology and expertise in the manufacture and process development of ALD systems.

Picosun takes pride in the fact that 40 years in the field of ALD system design has resulted in this advancement in graphene manufacture, enabling genuine, tangible products for future ICT, space, medical and consumer electronics applications.

We have used Picosun’s Advanced PEALD (plasma-enhanced ALD) system to testify that atomic layer deposition is a viable new technique for the growth of high-quality graphene. More importantly, this work demonstrates the possibility of integration of graphene into semiconductor technologies for possible microelectronic device applications.

Prof. Wei Ren, director of the Electronic Materials Research Laboratory from Xi’an Jiaotong University

Picosun offers state-of-the-art ALD thin film technology and helps the industry to advance by providing innovative, excellent coating solutions. Presently, PICOSUN™ ALD systems are used regularly in several major industries globally. This Finland-based company has subsidiaries in China, USA and Singapore and a global sales and support network.

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