Aug 2 2007
RASIRC™, the steam purification company, announces the availability of the white paper, Improved Oxide Growth Rate and Uniformity through New Steam Delivery Method, by Jeff Spiegelman. The paper can be accessed at http://www.rasirc.com/resources/whitepapers/whitepaper_oxidation.pdf. The paper provides test results that show an improvement from 7 to 20% in oxide growth and increased uniformity when a RASIRC Steamer using de-ionized water is used to generate ultra pure water vapor for wet thermal oxidation of silicon wafers.
“Test results described in the paper were collected from installations at three different fabs,” explained Jeffrey Spiegelman, founder and president of RASIRC. “Each Steamer installation replaced a different form of water vapor delivery. Expected benefits were lower cost, improved safety, and reduced film contamination. These expectations were met, plus we also found unexpected, yet significant improvements in uniformity and growth rates. The paper details our findings.”