In Session 11 of the KLA Instruments™ Indentation University, the discussion focuses on analytic modeling to account for the influence of the substrate when characterizing a thin film. The Song-Pharr and Hay-Crawford models are also covered.
About this Webinar
Session 11 first explains the theory behind modeling a thin film on a substrate, then uses finite element analysis to model different combinations of film and substrate compliance and stiffness. Two applications are then discussed: (1) low-k films on silicon and (2) CrN on steel, with experimental results presented.
Note: for Session 11, it is recommended to view the following Indentation University webinars as background for the discussion:
Attend this Indentation University webinar and you will:
- Understand the importance of accounting for substrate influence on thin films measurement
- Learn about the Song-Pharr and Hay-Crawford models and how they are different
- Look at the results from measurements of low-k films on silicon and CrN on steel
About the Speaker
Jennifer Hay, Senior Applications Scientist, KLA Instruments
Jennifer Hay is formerly a Senior Applications Engineer at KLA Instruments, specializing in nanoindentation. Prior to joining KLA, she worked in a similar capacity at Nanomechanics, Keysight, Agilent, and MTS Systems Corporation.
Jennifer has been working with nanoindentation since 1996, advancing standardization while also developing methodology for new applications, including thin films, polymers, gels, and biomaterials.
She served as the chair for the MEMS/Nanomechanics technical division of the Society of Experimental Mechanics (SEM), and she has authored many journal articles on nanoindentation, including an invited feature series in the SEM journal Experimental Techniques.
Who Should Attend
If you are a nanoindenter user interested in the measurement of the mechanical properties of thin films, then this webinar is for you.
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